Nanoscale Roughness Effects at the Interface of Lithography and Plasma Etching: Modeling of Line-Edge-Roughness Transfer During Plasma Etching

2009 ◽  
Vol 37 (9) ◽  
pp. 1705-1714 ◽  
Author(s):  
G. Kokkoris ◽  
V. Constantoudis ◽  
E. Gogolides
Keyword(s):  
Plasma Etching ◽  
Line Edge Roughness ◽  
Roughness Effects ◽  
Edge Roughness ◽  
Nanoscale Roughness

Line edge roughness transfer during plasma etching: modeling approaches and comparison with experimental results

2009 ◽  
Author(s):  
Vassilios Constantoudis ◽  
George Kokkoris ◽  
Panayiota Xydi ◽  
Evangelos Gogolides ◽  
Erwine Pargon ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Experimental Results ◽  
Line Edge Roughness ◽  
Modeling Approaches ◽  
Edge Roughness

Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness

2011 ◽  
Author(s):  
Simi A. George ◽  
Patrick P. Naulleau ◽  
Eric M. Gullikson ◽  
Iacopo Mochi ◽  
Farhad Salmassi ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Line Edge Roughness ◽  
Roughness Effects ◽  
Lithographic Patterning ◽  
Edge Roughness
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