Mechanism for Generation of Molecular-Level Line-Edge Roughness of ArF photoresist during Plasma Etching Processes

2009 ◽  
Author(s):  
K. Koyama ◽  
B. Jinnai ◽  
S. Maeda ◽  
K. Kato ◽  
A. Yasuda ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Molecular Level ◽  
Level Line ◽  
Line Edge Roughness ◽  
Edge Roughness

Line edge roughness transfer during plasma etching: modeling approaches and comparison with experimental results

2009 ◽  
Author(s):  
Vassilios Constantoudis ◽  
George Kokkoris ◽  
Panayiota Xydi ◽  
Evangelos Gogolides ◽  
Erwine Pargon ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Experimental Results ◽  
Line Edge Roughness ◽  
Modeling Approaches ◽  
Edge Roughness

Modeling of line edge roughness transfer during plasma etching

2009 ◽  
Vol 86 (4-6) ◽  
pp. 968-970 ◽  
Author(s):  
V. Constantoudis ◽  
G. Kokkoris ◽  
P. Xydi ◽  
G.P. Patsis ◽  
E. Gogolides
Keyword(s):  
Plasma Etching ◽  
Line Edge Roughness ◽  
Edge Roughness

Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

2008 ◽  
Vol 47 (4) ◽  
pp. 2501-2505 ◽  
Author(s):  
Atsuko Yamaguchi ◽  
Daisuke Ryuzaki ◽  
Ken-ichi Takeda ◽  
Jiro Yamamoto ◽  
Hiroki Kawada ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness
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