High performance 60 nm CMOS technology enhanced with BST (body-slightly-tied) structure SOI and Cu/low-k (k=2.9) interconnect for microprocessors

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) ◽

10.1109/vlsit.2002.1015436 ◽

2003 ◽

Author(s):

I. Kudo ◽

S. Miyake ◽

T. Syo ◽

S. Maruyama ◽

Y. Yama ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

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A high performance 0.13 μm SOI CMOS technology with Cu interconnects and low-k BEOL dielectric

2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) ◽

10.1109/vlsit.2000.852818 ◽

2002 ◽

Author(s):

P. Smeys ◽

V. McGahay ◽

I. Yang ◽

J. Adkisson ◽

K. Beyer ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

Cu Interconnects ◽

Low K ◽

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Highly stable partial body tied SOI CMOS technology with Cu interconnect and low-k dielectric for high performance microprocessor

IEEE International SOI Conference SOI-02 ◽

10.1109/soi.2002.1044443 ◽

2002 ◽

Author(s):

Kim ◽

Oh ◽

Kang ◽

Oh ◽

Yoo ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

Partial Body ◽

Cu Interconnect ◽

Low K ◽

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An enhanced 16nm CMOS technology featuring 2nd generation FinFET transistors and advanced Cu/low-k interconnect for low power and high performance applications

2014 IEEE International Electron Devices Meeting ◽

10.1109/iedm.2014.7046970 ◽

2014 ◽

Author(s):

Shien-Yang Wu ◽

C.Y. Lin ◽

M.C. Chiang ◽

J.J. Liaw ◽

J.Y. Cheng ◽

...

Keyword(s):

Low Power ◽

High Performance ◽

Cmos Technology ◽

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A 0.13 μm CMOS technology with 193 nm lithography and Cu/low-k for high performance applications

International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) ◽

10.1109/iedm.2000.904382 ◽

2002 ◽

Author(s):

K.K. Young ◽

S.Y. Wu ◽

C.C. Wu ◽

C.H. Wang ◽

C.T. Lin ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

193 Nm ◽

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A 0.11 μm CMOS technology with copper and very-low-k interconnects for high-performance system-on-a-chip cores

International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) ◽

10.1109/iedm.2000.904381 ◽

2002 ◽

Author(s):

Y. Takao ◽

H. Kudo ◽

J. Mitani ◽

Y. Kotani ◽

S. Yamaguchi ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

Performance System ◽

System On A Chip ◽

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A 100 nm copper/low-k bulk CMOS technology with multi Vt and multi gate oxide integrated transistors for low standby power, high performance and RF/analog system on chip applications

2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) ◽

10.1109/vlsit.2002.1015370 ◽

2003 ◽

Author(s):

G.C.-F. Yeap ◽

J. Chen ◽

P. Grudowski ◽

Y. Jeon ◽

Y. Shiho ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

System On Chip ◽

Analog System ◽

Standby Power ◽

On Chip ◽

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High-performance 80-nm gate length SOI-CMOS technology with copper and very-low-k interconnects

2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) ◽

10.1109/vlsit.2000.852819 ◽

2002 ◽

Author(s):

K. Sukegawa ◽

M. Yamaji ◽

K. Yoshie ◽

K. Furumochi ◽

T. Maruyama ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

Gate Length ◽

Low K ◽

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High-Performance and Low-Power Bulk Logic Platform Utilizing FET Specific Multiple-Stressors with Highly Enhanced Strain and Full-Porous Low-k Interconnects for 45-nm CMOS Technology

2007 IEEE International Electron Devices Meeting ◽

10.1109/iedm.2007.4418915 ◽

2007 ◽

Author(s):

T. Miyashita ◽

K. Ikeda ◽

Y. S. Kim ◽

T. Yamamoto ◽

Y. Sambonsugi ◽

...

Keyword(s):

Low Power ◽

High Performance ◽

Multiple Stressors ◽

Cmos Technology ◽

Enhanced Strain ◽

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A Simple Sub-0.3/spl mu/m CMOS Technology With Five-level Interconnect Using Al-plug And HSQ Of Low-k For High Performance Processor

Symposium on VLSI Technology ◽

10.1109/vlsit.1997.623692 ◽

1997 ◽

Author(s):

Yoshiyama ◽

Okada ◽

Igarashi ◽

Yamada ◽

Shimizu ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

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A 0.11 μm CMOS technology featuring copper and very low k interconnects with high performance and reliability

Microelectronics Reliability ◽

10.1016/s0026-2714(01)00233-5 ◽

2002 ◽

Vol 42 (1) ◽

pp. 15-25 ◽

Author(s):

Yoshihiro Takao ◽

Hiroshi Kudo ◽

Junichi Mitani ◽

Yoshiyuki Kotani ◽

Satoshi Yamaguchi ◽

...

Keyword(s):

High Performance ◽

Cmos Technology ◽

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