Analysis of Unsteady Heat and Mass Transfer During the Modified Chemical Vapor Deposition Process

1998 ◽  
Vol 120 (4) ◽  
pp. 858-864 ◽  
Author(s):  
K. S. Park ◽  
M. Choi

An analysis of unsteady heat and mass transfer in the modified chemical vapor deposition has been carried out. It is found that the commonly used quasi-steady-state assumption could be used to predict the overall efficiency of particle deposition; however, the assumption would not be valid near the inlet region where tapered deposition occurs. The present unsteady calculations have been found to be capable of predicting the detailed deposition profile correctly even from the inlet region where further optimization is needed at a practical situation. The present results have also been compared with existing experimental data and were in good agreement. It is noted that previous quasi-steady calculation resulted in a significant difference in the deposition profile near the inlet region. The effects of time-varying torch speeds were also studied. The case of a linearly varying torch speed resulted in a much shorter tapered entry than the case of a constant torch speed.

1991 ◽  
Vol 113 (2) ◽  
pp. 400-406 ◽  
Author(s):  
Y. T. Lin ◽  
M. Choi ◽  
R. Greif

A study has been made of the heat transfer, flow, and particle deposition relative to the modified chemical vapor deposition (MCVD) process. The effects of variable properties, buoyancy, and tube rotation have been included in the study. The resulting three-dimensional temperature and velocity fields have been obtained for a range of conditions. The effects of buoyancy result in asymmetric temperature and axial velocity profiles with respect to the tube axis. Variable properties cause significant variations in the axial velocity along the tube and in the secondary flow in the region near the torch. Particle trajectories are shown to be strongly dependent on the tube rotation and are helices for large rotational speeds. The component of secondary flow in the radial direction is compared to the thermophoretic velocity, which is the primary cause of particle deposition in the MCVD process. Over the central portion of the tube the radial component of the secondary flow is most important in determining the motion of the particles.


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