Measurement of Radiation Transfer Through Nano-Apertures Using Near-Field Scanning Optical Microscopy

Author(s):

Eric X. Jin ◽

Xianfan Xu

Keyword(s):

Near Field ◽

Optical Resolution ◽

Optical Microscope ◽

Aluminum Film ◽

Optical Recording ◽

Enhanced Transmission ◽

Ultrahigh Density ◽

Near Field Scanning ◽

Made In

Ridge apertures in various shapes have attracted extensive studies which showed their potential capabilities in realizing both enhanced transmission and nanoscale optical resolution, therefore, enabling ultrahigh density near-field optical recording. In this work, the optical near field distributions of an H-shaped ridge aperture and comparable regular apertures made in aluminum film are experimentally investigated using a home-made near-field scanning optical microscope. With a sub-100 nm aperture probe, the full-width half-magnitude (FWHM) near-field spot of the H aperture is measured as 106 nm by 80 nm, comparable to the gap size but substantially smaller than that obtained from a square aperture with the same area. The elongated near-field light spot in the direction across the ridges is due to the scattering of the transmitted light on the edges based on results of numerical calculations.

Obtaining Subwavelength Optical Spots Using Nanoscale Ridge Apertures

Journal of Heat Transfer ◽

10.1115/1.2401196 ◽

2006 ◽

Vol 129 (1) ◽

pp. 37-43 ◽

Cited By ~ 10

Author(s):

E. X. Jin ◽

X. Xu

Keyword(s):

Light Transmission ◽

Incident Light ◽

Near Field ◽

Optical Resolution ◽

Maximum Size ◽

Materials Processing ◽

Enhanced Transmission ◽

Field Radiation ◽

Concentrating light into a nanometer domain is needed for optically based materials processing at the nanoscale. Conventional nanometer-sized apertures suffer from low light transmission, therefore poor near-field radiation. It has been suggested that ridge apertures in various shapes can provide enhanced transmission while maintaining the subwavelength optical resolution. In this work, the near-field radiation from an H-shaped ridge nanoaperture fabricated in an aluminum thin film is experimentally characterized using near-field scanning optical microscopy. With the incident light polarized along the direction across the gap in the H aperture, the H aperture is capable of providing an optical spot of about 106nm by 80nm in full-width half-maximum size, which is comparable to its gap size and substantially smaller than those obtained from the square and rectangular apertures of the same opening area. Finite different time domain simulations are used to explain the experimental results. Variations between the spot sizes obtained from a 3×3 array of H apertures are about 4–6%. The consistency and reliability of the near-field radiation from the H apertures show their potential as an efficient near-field light source for materials processing at the nanoscale.

Near-field scanning optical microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100144644 ◽

1986 ◽

Vol 44 ◽

pp. 642-643

Author(s):

E. Betzig ◽

A. Harootunian ◽

M. Isaacson ◽

A. Lewis

Keyword(s):

Near Field ◽

Optical Microscope ◽

Visible Radiation ◽

Field Methods ◽

Optical Elements ◽

Optical Region ◽

Order Of Magnitude ◽

Nondestructive Imaging ◽

In general, conventional methods of optical imaging are limited in spatial resolution by either the wavelength of the radiation used or by the aberrations of the optical elements. This is true whether one uses a scanning probe or a fixed beam method. The reason for the wavelength limit of resolution is due to the far field methods of producing or detecting the radiation. If one resorts to restricting our probes to the near field optical region, then the possibility exists of obtaining spatial resolutions more than an order of magnitude smaller than the optical wavelength of the radiation used. In this paper, we will describe the principles underlying such "near field" imaging and present some preliminary results from a near field scanning optical microscope (NS0M) that uses visible radiation and is capable of resolutions comparable to an SEM. The advantage of such a technique is the possibility of completely nondestructive imaging in air at spatial resolutions of about 50nm.

Near-field scanning optical microscopy local luminescence studies of rhodamine dye

Open Physics ◽

10.2478/s11534-009-0109-6 ◽

2010 ◽

Vol 8 (3) ◽

Author(s):

Petr Klapetek ◽

Juraj Bujdák ◽

Jiří Buršík

Keyword(s):

Time Domain ◽

Near Field ◽

Optical Microscope ◽

Far Field ◽

Luminescence Signal ◽

Local Topography ◽

Field Radiation ◽

Rhodamine Dye ◽

AbstractThis article presents results of near-field scanning optical microscope measurement of local luminescence of rhodamine 3B intercalated in montmorillonite samples. We focus on how local topography affects both the excitation and luminescence signals and resulting optical artifacts. The Finite Difference in Time Domain method (FDTD) is used to model the electromagnetic field distribution of the full tip-sample geometry including far-field radiation. Even complex problems like localized luminescence can be simulated computationally using FDTD and these simulations can be used to separate the luminescence signal from topographic artifacts.

Ultrahigh-density optical recording using a scanning near-field optical microscope

10.1117/12.302401 ◽

1998 ◽

Author(s):

Yuan Ying Lu ◽

Din Ping Tsai ◽

Wen R. Guo ◽

Sheng-Chang Chen ◽

Jia Reuy Liu ◽

...

Keyword(s):

Near Field ◽

Optical Microscope ◽

Optical Recording ◽

Ultrahigh Density

Measurement of Strain Associated with Defects in SiTiO3 Bicrystals using Near-Field Scanning Optical Microscopy

MRS Proceedings ◽

10.1557/proc-474-131 ◽

1997 ◽

Vol 474 ◽

Author(s):

E. B. McDaniel ◽

J. W. P. Hsu

Keyword(s):

Optical Microscopy ◽

Near Field ◽

Optical Microscope ◽

Nanometer Scale ◽

Polarization Modulation ◽

Reflection Symmetry ◽

Strain Fields ◽

Modulation Technique ◽

ABSTRACTWe incorporate a polarization modulation technique in a near-field scanning optical microscope (NSOM) for quantitative polarimetry studies at the nanometer scale. Using this technique, we map out stress-induced birefringence associated with submicron defects at the fusion boundaries of SiTiO3 bicrystals. The strain fields surrounding these defects are larger than the defect sizes and show complex spiral shapes that break the reflection symmetry of the bicrystal boundary.

Near-Field Optical Recording by Reflection-Mode Near-Field Scanning Optical Microscope: Submicron-Sized Marks and Their Thermodynamic Stability

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.984 ◽

2000 ◽

Vol 39 (Part 1, No. 2B) ◽

pp. 984-985 ◽

Cited By ~ 3

Author(s):

Myong R. Kim ◽

June-Hyoung Park ◽

Wonho Jhe

Keyword(s):

Thermodynamic Stability ◽

Near Field ◽

Optical Microscope ◽

Optical Recording ◽

Reflection Mode ◽

Laser Reviews. Ultrahigh Density Optical Recording by the Use of Scanning Near-Field Optical Microscope.

The Review of Laser Engineering ◽

10.2184/lsj.24.1045 ◽

1996 ◽

Vol 24 (10) ◽

pp. 1045-1050 ◽

Cited By ~ 3

Author(s):

Mitsuo HAMANO ◽

Masahiro IRIE

Keyword(s):

Near Field ◽

Optical Microscope ◽

Optical Recording ◽

Ultrahigh Density

Progress in near-field scanning optical microscopy (NSOM)

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100104248 ◽

1988 ◽

Vol 46 ◽

pp. 436-437

Author(s):

E. Betzig ◽

M. Isaacson ◽

H. Barshatzky ◽

K. Lin ◽

A. Lewis

Keyword(s):

Optical Microscopy ◽

Near Field ◽

Visible Region ◽

Optical Microscope ◽

Scanning Tunneling ◽

Far Field ◽

Tunneling Microscopy ◽

Near Field Scanning ◽

Scanning Electron

The concept of near field scanning optical microscopy was first described more than thirty years ago1 almost two decades before the validity of the technique was verified experimentally for electromagnetic radiation of 3cm wavelength.2 The extension of the method to the visible region of the spectrum took another decade since it required the development of micropositioning and aperture fabrication on a scale five orders of magnitude smaller than that used for the microwave experiments. Since initial reports on near field optical imaging8-6, there has been a growing effort by ourselves6 and other groups7 to extend the technology and develop the near field scanning optical microscope (NSOM) into a useful tool to complement conventional (i.e., far field) scanning optical microscopy (SOM), scanning electron microscopy (SEM) and scanning tunneling microscopy. In the context of this symposium on “Microscopy Without Lenses”, NSOM can be thought of as an addition to the exploding field of scanned tip microscopy although we did not originally conceive it as such.

Resolution in near-field optical microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010008657x ◽

1991 ◽

Vol 49 ◽

pp. 454-455

Author(s):

M. Isaacson

Keyword(s):

Optical Microscopy ◽

Near Field ◽

Optical Resolution ◽

Super Resolution ◽

Optical Probe ◽

Basic Principles ◽

Super Resolution Microscopy ◽

Near Field Scanning ◽

Probe Source

It has only been within the last half decade that the concept of super resolution microscopy in the near-field has been vigorously pursued and experimentally demonstrated. However, the idea of optical resolution unhindered by far field diffraction limitations was conceived more than a half century ago by Synge and further elaborated by O'Keefe in the fifties. That die method was possible, however, was only first demonstrated using 3cm wavelength microwaves almost 20 years later.The basic principles of the method of near field scanning optical microscopy (NSOM) have been described before in the literature. Briefly, the idea is as follows: if an optical probe (source or detector) of diameter D is positioned within a distance of approximately D/π from the surface of an object, and the reflected, transmitted or emitted light is detected, then the lateral spatial region from which the information occurs is limited to aregion of approximate size D and not by the wavelength of the illuminated or detected light.

Scanning electron microscopy 1928-1965

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100149647 ◽

1993 ◽

Vol 51 ◽

pp. 762-763 ◽

Cited By ~ 3

Author(s):

D. McMullan

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Electron Microscope ◽

Near Field ◽

Optical Microscope ◽

Cambridge University ◽

Engineering Department ◽

Near Field Scanning ◽

Scanning Electron ◽

Made In

The beginning of the general use of the scanning electron microscope (SEM) can be accurately dated to 1965 when the Cambridge Instrument Company in the U.K. marketed their Stereoscan 1 SEM (to be followed about 6 months later by JEOL in Japan). But development had been in progress intermittently over the previous 30 years in Germany, the U.S.A., France, and the U.K. where in 1948 work was begun in Charles Oatley’s department at the Cambridge University Engineering Department which led directly to the Stereoscan. The purpose of this paper is to trace the development of the SEM and to show that some of the ideas pul forward by the early workers were well ahead of their time and only became technologically practicable much later.The First proposal for the application of scanning to microscopy was made in 1928 by Synge, an Irish scientific dilettante, who conceived the near-field scanning optical microscope but did not attempt to build one.