Characterization of Leakage and Reliability of SiNx Gate Dielectric by Low-Pressure Chemical Vapor Deposition for GaN-based MIS-HEMTs

2015 ◽  
Vol 62 (10) ◽  
pp. 3215-3222 ◽  
Author(s):  
Mengyuan Hua ◽  
Cheng Liu ◽  
Shu Yang ◽  
Shenghou Liu ◽  
Kai Fu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Gate Dielectric ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical

scholarly journals Characterization of TiN film grown by low-pressure-chemical-vapor-deposition

1997 ◽  
Vol 308-309 ◽  
pp. 594-598 ◽  
Author(s):  
Y.J Mei ◽  
T.C Chang ◽  
J.C Hu ◽  
L.J Chen ◽  
Y.L Yang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Tin Film ◽  
Pressure Chemical

Preparation and characterization of CrO2 films by Low Pressure Chemical Vapor Deposition from CrO3

2013 ◽  
Vol 539 ◽  
pp. 1-11 ◽  
Author(s):  
C. Aguilera ◽  
J.C. González ◽  
A. Borrás ◽  
D. Margineda ◽  
J.M. González ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical
Sign in / Sign up

Export Citation Format

Share Document