Characterization of plasma-enhanced chemical vapor deposition carbon nanotubes by Auger electron spectroscopy

2002 ◽  
Vol 20 (1) ◽  
pp. 116 ◽  
Author(s):  
K. B. K. Teo ◽  
M. Chhowalla ◽  
G. A. J. Amaratunga ◽  
W. I. Milne ◽  
G. Pirio ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Auger Electron Spectroscopy ◽  
Vapor Deposition ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Chemical Vapor

Stranski–Krastanov Growth of Tungsten during Chemical Vapor Deposition Revealed by Micro-Auger Electron Spectroscopy

2004 ◽  
Vol 43 (10) ◽  
pp. 6974-6977 ◽  
Author(s):  
Suguru Noda ◽  
Takeshi Tsumura ◽  
Jota Fukuhara ◽  
Takashi Yoda ◽  
Hiroshi Komiyama ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Auger Electron Spectroscopy ◽  
Vapor Deposition ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Chemical Vapor

Anomalous Selective Tungsten- Growth by -Chemical- Vapor -Deposition

1996 ◽  
Vol 427 ◽  
Author(s):  
Yu-Jane Mei ◽  
Ting-Chang Chang ◽  
Jeng-Dong Sheu ◽  
Wen-Kuan Yeh ◽  
Fu-Ming Pan ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Auger Electron Spectroscopy ◽  
Vapor Deposition ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Chemical Vapor ◽  
Deep Submicron ◽  
Anomalous Feature ◽  
Via Hole ◽  
Hole Bottom

AbstractSelective tungsten chemical vapor deposition (W-CVD) is one of the most attractive technique for filling deep submicron contact hole and via hole for the ULSI application. In this work, we firstly find out the anomalous selective W growth for the contact hole. The tungsten only nucleates from the side ring of the contact hole bottom. Several predeposition treatments prior to W growth can improve this anomalous feature and excellently selective W growth can be achieved. Auger electron spectroscopy (AES) is utilized to investigate the interface of Si/W. A model has been proposed to explain this anomalous selective tungsten growth.

scholarly journals Characterization of Carbon Nanotubes with TiO2 by the (CVD) Chemical Vapor Deposition Method

2018 ◽  
Vol 24 (S1) ◽  
pp. 1094-1095 ◽  
Author(s):  
Abraham A. Mejía ◽  
L. Béjar ◽  
C. Parra ◽  
C. Aguilar ◽  
A. Medina ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Method ◽  
Deposition Method

Electron Microscopy and Raman Characterization of Multi-Walled Carbon Nanotubes Grown by Chemical Vapor Deposition

2008 ◽  
Vol 14 (S2) ◽  
pp. 304-305
Author(s):  
M Ellis ◽  
T Jutarosaga ◽  
S Smith ◽  
Y Wei ◽  
S Seraphin
Keyword(s):  
Electron Microscopy ◽  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
New Mexico ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Multi Walled Carbon Nanotubes ◽  
Walled Carbon Nanotubes ◽  
Raman Characterization

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

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