Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
2013 ◽
Vol 31
(1)
◽
pp. 01A106
◽
Keyword(s):
2010 ◽
Vol 16
(47)
◽
pp. 13925-13929
◽
Keyword(s):
Keyword(s):
2018 ◽
Vol 89
(12)
◽
pp. 123702
◽
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):