Synthesis of hydrogenated diamondlike carbon thin films using neon–acetylene based high power impulse magnetron sputtering discharges

This paper presents studies on the friction and wear of diamond-like carbon thin films deposited on steel substrates via magnetron sputtering. The testing mode is ball-on-disc. The graphitization of diamondlike carbon during the tribotest explains the low coefficients of friction (0,09-0,15) observed. The bias voltage plays an important role on the film’s microstructure thus the friction and wear of the films in tribotests. The results showed great potential for applications of diamond-like carbon thin films in engineering.

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Effects of process parameters on optical characteristics of diamond-like carbon thin films deposited using high-power impulse magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2019.137562 ◽

2019 ◽

Vol 690 ◽

pp. 137562

Author(s):

Jian-Fu Tang ◽

Yi-Jing Tsai ◽

Chun-Hong Huang ◽

Ching-Yen Lin ◽

Fu-Chi Yang ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Process Parameters ◽

High Power ◽

Optical Characteristics ◽

Diamond Like Carbon ◽

Carbon Thin Films

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Deposition of diamond-like carbon thin films by the high power impulse magnetron sputtering method

Diamond and Related Materials ◽

10.1016/j.diamond.2017.01.007 ◽

2017 ◽

Vol 72 ◽

pp. 71-76 ◽

Cited By ~ 8

Author(s):

A. Wiatrowski ◽

W. Kijaszek ◽

W.M. Posadowski ◽

W. Oleszkiewicz ◽

J. Jadczak ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

High Power ◽

Diamond Like Carbon ◽

Carbon Thin Films

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Microstructure and electrical property of tantalum oxynitride thin films prepared using high-power impulse reactive magnetron sputtering

Japanese Journal of Applied Physics ◽

10.35848/1347-4065/abc0ae ◽

2020 ◽

Vol 59 (11) ◽

pp. 116502

Author(s):

Ping-Yuan Lee ◽

Cheng-Xian Lin ◽

Ying-Chieh Lee

Keyword(s):

Thin Films ◽

Electrical Property ◽

Magnetron Sputtering ◽

High Power ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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High Power Impulse Magnetron Sputtering of In2O3/Sn Cold Sprayed Composite Target

Materials ◽

10.3390/ma14051228 ◽

2021 ◽

Vol 14 (5) ◽

pp. 1228

Author(s):

Marcin Winnicki ◽

Artur Wiatrowski ◽

Michał Mazur

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

High Voltage ◽

High Power ◽

Power Supply ◽

Indium Tin Oxide ◽

Volume Ratio ◽

Cold Spraying ◽

High Voltage Power Supply ◽

Composite Target

High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.

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