Adhesion of titanium thin film to oxide substrates

1987 ◽  
Vol 5 (5) ◽  
pp. 2890-2893 ◽  
Author(s):  
Y.‐H. Kim ◽  
Y. S. Chaug ◽  
N. J. Chou ◽  
J. Kim
Author(s):  
E E Suslov ◽  
A S Larionov ◽  
S B Kislitsin ◽  
I I Chernov ◽  
M S Staltsov ◽  
...  

2012 ◽  
Vol 1 (1) ◽  
pp. 46 ◽  
Author(s):  
Amir Mahyar Khorasani ◽  
Mohammad Reza Solymany yazdi ◽  
Mehdi Faraji ◽  
Alex Kootsookos

Thin-film coating plays a prominent role on the manufacture of many industrial devices. Coating can increase material performance due to the deposition process. Having adequate and precise model that can predict the hardness of PVD and CVD processes is so helpful for manufacturers and engineers to choose suitable parameters in order to obtain the best hardness and decreasing cost and time of industrial productions. This paper proposes the estimation of hardness of titanium thin-film layers as protective industrial tools by using multi-layer perceptron (MLP) neural network. Based on the experimental data that was obtained during the process of chemical vapor deposition (CVD) and physical vapor deposition (PVD), the modeling of the coating variables for predicting hardness of titanium thin-film layers, is performed. Then, the obtained results are experimentally verified and very accurate outcomes had been attained.


Langmuir ◽  
2010 ◽  
Vol 26 (3) ◽  
pp. 1973-1982 ◽  
Author(s):  
Elena P. Ivanova ◽  
Vi Khanh Truong ◽  
James Y. Wang ◽  
Christopher C. Berndt ◽  
Robert T. Jones ◽  
...  

1997 ◽  
Vol 71 (17) ◽  
pp. 2466-2468 ◽  
Author(s):  
M. Huth ◽  
C. P. Flynn

Author(s):  
Zhaohui Shan ◽  
Suresh K. Sitaraman

Titanium thin films have been widely used in microelectronics due to their good adhesion to substrates, such as Silicon wafer and Quartz. However, mechanical behavior of Titanium thin films has not been well characterized. This paper presents a methodology that combines the nanoindentation technique and finite element modeling to characterize the mechanical (elastic and plastic) properties of thin film with its application on Titanium thin film deposited on silicon substrate. The results show that the elastic properties (Young’s modulus) of the Titanium thin film does not change much from the bulk Titanium, and the plastic properties (yield stress and strain hardening exponent) of the Titanium thin film are higher than those of bulk Titanium. This method is also applicable for the study of mechanical properties of other thin films and small volume materials.


2014 ◽  
Vol 15 (1) ◽  
pp. 015006 ◽  
Author(s):  
Andrei Ionut Mardare ◽  
Alfred Ludwig ◽  
Alan Savan ◽  
Achim Walter Hassel

1990 ◽  
Vol 29 (Part 1, No. 9) ◽  
pp. 1805-1806 ◽  
Author(s):  
Ryosuke Konishi ◽  
Satoshi Ikeda ◽  
Tomoyuki Osaki ◽  
Hiroshi Sasakura

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