A comparison of SiO2 planarization layers by hollow cathode enhanced direct current reactive magnetron sputtering and radio frequency magnetron sputtering

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

7179. A comparison of SiO2 planarization layers by hallow cathode enhanced direct current reactive magnetron sputtering and radio frequency magnetron sputtering

Vacuum ◽

10.1016/0042-207x(91)90986-s ◽

1991 ◽

Vol 42 (8-9) ◽

pp. 567

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Mechanism of Growth of Cr$_{2}$O$_{3}$ Thin Films on ($1\bar{1}02$), ($11\bar{2}0$), and (0001) Surfaces of Sapphire Substrates by Direct Current–Radio Frequency Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.11pg12 ◽

2012 ◽

Vol 51 ◽

pp. 11PG12 ◽

Cited By ~ 1

Author(s):

Nobuyuki Iwata ◽

Takuji Kuroda ◽

Hiroshi Yamamoto

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Sapphire Substrates ◽

Mechanism Of Growth

Structural and electrochemical properties of LiNi0.7Co0.15Mn0.15O2 thin film prepared by high frequency hybrid direct current and radio frequency magnetron sputtering

Journal of Electroceramics ◽

10.1007/s10832-013-9845-5 ◽

2013 ◽

Vol 31 (3-4) ◽

pp. 316-323 ◽

Cited By ~ 3

Author(s):

Youngmin Chung ◽

Ho-young Park ◽

Si-hyoung Oh ◽

Dong Young Yoon ◽

Sang-wan Jin ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Electrochemical Properties ◽

Direct Current ◽

High Frequency ◽

Influence of substrate direct current bias voltage on microcrystalline silicon growth during radio-frequency magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2007.11.004 ◽

2008 ◽

Vol 82 (8) ◽

pp. 777-781 ◽

Cited By ~ 4

Author(s):

A. Tabata ◽

K. Fukaya ◽

T. Mizutani

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Bias Voltage ◽

Direct Current ◽

Microcrystalline Silicon ◽

Direct Current Bias ◽

Silicon Growth ◽

Influence Of Substrate

Stereometric analysis of Ti 1− x Al x N thin films deposited by direct current/radio frequency magnetron sputtering

Microscopy Research and Technique ◽

10.1002/jemt.23905 ◽

2021 ◽

Author(s):

Robert Saraiva Matos ◽

Henrique Duarte Fonseca Filho ◽

Abhijeet Das ◽

Sanjeev Kumar ◽

Vipin Chawla ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Mechanical, tribological and corrosion properties of CrBN films deposited by combined direct current and radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2013.02.103 ◽

2013 ◽

Vol 544 ◽

pp. 335-340 ◽

Cited By ~ 17

Author(s):

Vera Jahodova ◽

Xing-zhao Ding ◽

Debbie H.L. Seng ◽

W. Gulbinski ◽

P. Louda

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Corrosion Properties

In situ stress measurements on niobium nitride thin films produced by hollow cathode enhanced direct current reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577297 ◽

1991 ◽

Vol 9 (4) ◽

pp. 2442-2446 ◽

Cited By ~ 3

Author(s):

David F. Dawson‐Elli ◽

David Plantz ◽

Donald S. Stone ◽

James E. Nordman

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Hollow Cathode ◽

In Situ Stress ◽

Niobium Nitride ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

In Situ Stress Measurements

Mechanism of Growth of Cr2O3Thin Films on (11̄02), (112̄0), and (0001) Surfaces of Sapphire Substrates by Direct Current–Radio Frequency Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.11pg12 ◽

2012 ◽

Vol 51 (11S) ◽

pp. 11PG12 ◽

Cited By ~ 9

Author(s):

Nobuyuki Iwata ◽

Takuji Kuroda ◽

Hiroshi Yamamoto

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Sapphire Substrates ◽

Mechanism Of Growth

Effect of Plused Negative Bias on Nucleation and Morphological Evolution of ZnO Films Deposited by Reactive Radio-frequency Magnetron Sputtering

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2009.00602 ◽

2009 ◽

Vol 24 (3) ◽

pp. 602-606 ◽

Cited By ~ 1

Author(s):

Wei-Jia FU ◽

Zhi-Wen LIU ◽

Jian-Feng GU ◽

Ming LIU ◽

Qing-Yu ZHANG

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Morphological Evolution ◽

Zno Films ◽

Negative Bias ◽

Effect of sputtering power on the properties of SiO2 films grown by radio frequency magnetron sputtering at room temperature

Optical and Quantum Electronics ◽

10.1007/s11082-020-02639-4 ◽

2021 ◽

Vol 53 (1) ◽

Author(s):

Changjiang Zhao ◽

Leran Zhao ◽

Juncheng Liu ◽

Zhigang Liu ◽

Yan Chen

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Room Temperature ◽

Sio2 Films ◽

Sputtering Power