In situ stress measurements on niobium nitride thin films produced by hollow cathode enhanced direct current reactive magnetron sputtering
1991 ◽
Vol 9
(4)
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pp. 2442-2446
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1999 ◽
Vol 17
(6)
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pp. 3317-3321
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1995 ◽
Vol 6
(1)
◽
pp. 31-40
2016 ◽
Vol 688
◽
pp. 44-50
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Keyword(s):
Keyword(s):