Ultrahigh-selectivity silicon nitride etch process using an inductively coupled plasma source
1998 ◽
Vol 16
(3)
◽
pp. 1582-1587
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2010 ◽
Vol 49
(5)
◽
pp. 056505
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Keyword(s):
2002 ◽
Vol 41
(Part 2, No. 12B)
◽
pp. L1495-L1498
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2002 ◽
Vol 20
(5)
◽
pp. 1566-1573
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Keyword(s):
2014 ◽
Vol 85
(1)
◽
pp. 013510
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Keyword(s):
1983 ◽
Vol 2
(10)
◽
pp. 225-230
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Keyword(s):
Keyword(s):
1996 ◽
Vol 143
(4)
◽
pp. 1375-1383
◽
Keyword(s):
2004 ◽
Vol 19
(1)
◽
pp. 149
◽
Keyword(s):
2000 ◽
Vol 147
(4)
◽
pp. 1481
◽
2012 ◽
Vol 27
(6)
◽
pp. 989
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Keyword(s):