Analysis of surface contaminants on gallium arsenide and silicon by high-resolution time-of-flight secondary ion mass spectrometry

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584777 ◽

1989 ◽

Vol 7 (3) ◽

pp. 512 ◽

Author(s):

E. Niehuis

Keyword(s):

Mass Spectrometry ◽

Gallium Arsenide ◽

High Resolution ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Resolution Time ◽

Surface Contaminants ◽

Ion Mass Spectrometry ◽

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Surface analysis of pyrite in the No. 9 coal seam, Wuda Coalfield, Inner Mongolia, China, using high-resolution time-of-flight secondary ion mass-spectrometry

International Journal of Coal Geology ◽

10.1016/s0166-5162(03)00109-5 ◽

2003 ◽

Vol 55 (2-4) ◽

pp. 139-150 ◽

Author(s):

Shifeng Dai ◽

Xiaoqiang Hou ◽

Deyi Ren ◽

Yuegang Tang

Keyword(s):

Mass Spectrometry ◽

High Resolution ◽

Coal Seam ◽

Surface Analysis ◽

Inner Mongolia ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Resolution Time ◽

Ion Mass Spectrometry ◽

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Surface and trace analysis by high‐resolution time‐of‐flight secondary ion mass spectrometry

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576009 ◽

1989 ◽

Vol 7 (3) ◽

pp. 1823-1828 ◽

Author(s):

E. Niehuis ◽

T. Heller ◽

U. Jürgens ◽

A. Benninghoven

Keyword(s):

Mass Spectrometry ◽

High Resolution ◽

Trace Analysis ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Resolution Time ◽

Ion Mass Spectrometry ◽

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Development of Source Apportionment of Individual Particle by High Resolution Time of Flight-Secondary Ion Mass Spectrometry

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.55.104 ◽

2012 ◽

Vol 55 (3) ◽

pp. 104-107 ◽

Author(s):

Norihito MAYAMA ◽

Eita GOTO ◽

Yusuke MIURA ◽

Kenji OHISHI ◽

Tetsuo SAKAMOTO ◽

...

Keyword(s):

Mass Spectrometry ◽

High Resolution ◽

Source Apportionment ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Individual Particle ◽

Resolution Time ◽

Ion Mass Spectrometry ◽

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High resolution 3-D imaging for characteristics of (111)-oriented Pb(Zr0.35Ti0.65)O3 thin film by using time-of-flight secondary ion mass spectrometry and piezoresponse force microscopy

Electronic Materials Letters ◽

10.1007/s13391-011-0916-y ◽

2011 ◽

Vol 7 (3) ◽

pp. 265-270 ◽

Author(s):

Hyun-Chang Shin ◽

Joon-Tae Song

Keyword(s):

Thin Film ◽

Mass Spectrometry ◽

High Resolution ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Piezoresponse Force Microscopy ◽

Force Microscopy ◽

Ion Mass Spectrometry ◽

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High mass resolution time-of-flight secondary ion mass spectrometry. Application to peak assignments

Surface and Interface Analysis ◽

10.1002/sia.740140307 ◽

1989 ◽

Vol 14 (3) ◽

pp. 135-142 ◽

Author(s):

E. Niehuis ◽

P. N. T. Van Velzen ◽

J. Lub ◽

T. Heller ◽

A. Benninghoven

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Mass Resolution ◽

High Mass ◽

Resolution Time ◽

High Mass Resolution ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Mass Spectrometry Application

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High-Resolution Epifluorescence and Time-of-Flight Secondary Ion Mass Spectrometry Chemical Imaging Comparisons of Single DNA Microarray Spots

Analytical Chemistry ◽

10.1021/ac3019334 ◽

2012 ◽

Vol 84 (24) ◽

pp. 10628-10636 ◽

Author(s):

Archana N. Rao ◽

Nicolas Vandencasteele ◽

Lara J. Gamble ◽

David W. Grainger

Keyword(s):

Mass Spectrometry ◽

High Resolution ◽

Dna Microarray ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Chemical Imaging ◽

Ion Mass Spectrometry ◽

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Topography Measurements Using High Mass Resolution Time-of-Flight Secondary Ion Mass Spectrometry: Application to Banknotes

Analytical Chemistry ◽

10.1021/acs.analchem.9b00114 ◽

2019 ◽

Vol 91 (14) ◽

pp. 8864-8872 ◽

Author(s):

Alice Bejjani ◽

Manale Noun ◽

Serge Della-Negra ◽

Raymond Tannous ◽

Georges Chalhoub ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Mass Resolution ◽

High Mass ◽

Resolution Time ◽

High Mass Resolution ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Mass Spectrometry Application

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Investigation of the Surface Chemical Structure of Some Biomedical Poly(amidoamine)s Using High-Resolution X-ray Photoelectron Spectroscopy and Time-of-Flight Secondary Ion Mass Spectrometry

Macromolecules ◽

10.1021/ma00128a041 ◽

1995 ◽

Vol 28 (24) ◽

pp. 8259-8271 ◽

Author(s):

A. G. Shard ◽

L. Sartore ◽

M. C. Davies ◽

P. Ferruti ◽

A. J. Paul ◽

...

Keyword(s):

Mass Spectrometry ◽

High Resolution ◽

Photoelectron Spectroscopy ◽

Chemical Structure ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Surface Chemical ◽

X Ray ◽

Ion Mass Spectrometry ◽

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An investigation of the diffusion of silicon in delta‐doped gallium arsenide, as determined using high‐resolution secondary ion mass spectrometry

Journal of Applied Physics ◽

10.1063/1.349640 ◽

1991 ◽

Vol 70 (2) ◽

pp. 821-826 ◽

Author(s):

H. C. Nutt ◽

R. S. Smith ◽

M. Towers ◽

P. K. Rees ◽

D. J. James

Keyword(s):

Mass Spectrometry ◽

Gallium Arsenide ◽

High Resolution ◽

Secondary Ion Mass Spectrometry ◽

Ion Mass Spectrometry ◽

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Analysis of passivating oxide and surface contaminants on GaAs (100) by temperature-dependent and angle resolved x-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585858 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1291 ◽

Author(s):

F. Schröder

Keyword(s):

Mass Spectrometry ◽

Photoelectron Spectroscopy ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Temperature Dependent ◽

X Ray ◽

Surface Contaminants ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Passivating Oxide

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