Characteristics of carbon-containing low-k dielectric SiCN thin films deposited via remote plasma atomic layer deposition

2021 ◽  
Vol 39 (4) ◽  
pp. 042404
Author(s):  
Chanwon Jung ◽  
Seokhwi Song ◽  
Hyunwoo Park ◽  
Youngjoon Kim ◽  
Eun Jong Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Sicn Thin Films ◽  
Low K

Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment

2019 ◽  
Vol 40 (1) ◽  
pp. 012806 ◽  
Author(s):  
Hui Hao ◽  
Xiao Chen ◽  
Zhengcheng Li ◽  
Yang Shen ◽  
Hu Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Gallium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Plasma Pretreatment

scholarly journals Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films

2011 ◽  
Vol 158 (4) ◽  
pp. G92 ◽  
Author(s):  
M. E. Donders ◽  
H. C. M. Knoops ◽  
M. C. M. van ◽  
W. M. M. Kessels ◽  
P. H. L. Notten
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition

Remote Plasma Atomic Layer Deposition of HfO[sub 2] Thin Films Using the Alkoxide Precursor Hf(mp)[sub 4]

2006 ◽  
Vol 9 (6) ◽  
pp. G200 ◽  
Author(s):  
Seokhoon Kim ◽  
Jinwoo Kim ◽  
Jihoon Choi ◽  
Hyunseok Kang ◽  
Hyeongtag Jeon ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Alkoxide Precursor

Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition

2014 ◽  
Vol 26 (1) ◽  
pp. 014002 ◽  
Author(s):  
Huan-Yu Shih ◽  
Ming-Chih Lin ◽  
Liang-Yih Chen ◽  
Miin-Jang Chen
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition

scholarly journals Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2

2019 ◽  
Vol 41 (2) ◽  
pp. 321-330 ◽  
Author(s):  
Merijn E. Donders ◽  
Harm C. Knoops ◽  
W.M.M. Kessels ◽  
Peter H. Notten
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Electrochemically Active

Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO[sub 2] Thin Films

2011 ◽  
Vol 158 (1) ◽  
pp. H21 ◽  
Author(s):  
Hyungchul Kim ◽  
Sanghyun Woo ◽  
Jaesang Lee ◽  
Yongchan Kim ◽  
Hyerin Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Plasma Properties ◽  
Layer Deposition ◽  
Dc Bias
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