Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring

2014 ◽  
Vol 13 (4) ◽  
pp. 041408 ◽  
Author(s):  
Charles Settens ◽  
Aaron Cordes ◽  
Benjamin Bunday ◽  
Abner Bello ◽  
Vimal Kamineni ◽  
...  
Keyword(s):  
Process Monitoring ◽  
Small Angle ◽  
Critical Dimension ◽  
Fabrication Process ◽  
X Ray ◽  
X Ray Scattering ◽  
Scattering Measurement ◽  
Ray Scattering

scholarly journals X-ray Metrology for the SemiconductorIndustry Tutorial

2019 ◽  
Vol 124 ◽  
Author(s):  
Daniel F. Sunday ◽  
Wen-li Wu ◽  
Scott Barton ◽  
R. Joseph Kline
Keyword(s):  
Data Processing ◽  
Small Angle ◽  
Semiconductor Industry ◽  
Critical Dimension ◽  
Next Generation ◽  
Dimensional Metrology ◽  
X Ray ◽  
X Ray Scattering ◽  
Short Course ◽  
Ray Scattering

The semiconductor industry is in need of new, in-line dimensional metrology methods with higherspatial resolution for characterizing their next generation nanodevices. The purpose of this short course is to train the semiconductor industry on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS) method. The topics will include both data processing and instrumentation. The short course will also provide an opportunity for discussion of the requirements for CDSAXS and the necessary improvements in X-ray source technology. Expected audience include semiconductor manufacturers, equipment manufacturers, and component manufacturers. The presentations were made at “X-ray Metrology for the Semiconductor Industry” short course at the National Institute of Standards and Technology on Aug. 25, 2016.

Small angle X-ray scattering measurement of porosity in wood following pyrolysis

1983 ◽  
Vol 17 (4) ◽  
pp. 241-257 ◽  
Author(s):  
M. Kalliat ◽  
C. Y. Kwak ◽  
P. W. Schmidt ◽  
B. E. Cutter ◽  
E. A. McGinnes
Keyword(s):  
Small Angle ◽  
X Ray ◽  
X Ray Scattering ◽  
Scattering Measurement ◽  
Ray Scattering

Apparatus for the simultaneous measurement of the X-ray absorption factor developed for a small-angle X-ray scattering beamline

2007 ◽  
Vol 40 (4) ◽  
pp. 791-795 ◽  
Author(s):  
Takeshi Morita ◽  
Yoshitada Tanaka ◽  
Kazuki Ito ◽  
Yoshihiro Takahashi ◽  
Keiko Nishikawa
Keyword(s):  
Small Angle ◽  
Performance Test ◽  
X Rays ◽  
Absorption Factor ◽  
X Ray ◽  
X Ray Scattering ◽  
X Ray Absorption ◽  
Scattering Measurement ◽  
Ray Scattering

A novel apparatus has been developed that enables the simultaneous determination of the absorption factor during measurement of small-angle X-ray scattering (SAXS) intensities of a sample. It was designed especially for the use of relatively low-energy X-rays at SAXS beamlines of synchrotron facilities. The X-ray intensity of transmittance is measured by a silicon PIN photodiode, which is implanted in a direct beamstop set in a vacuum chamber. Since the assembly transmits an attenuated direct beam to a detector during the scattering measurement, a zero-angle position can be monitored without additional operation. It was confirmed that the linearity between the signal from the photodiode and the intensity of X-rays is good and the photodiode is applicable for the desired purpose. For a performance test, the absorption factors of a supercritical fluid were measured with a wide density range.

Critical-dimension grazing incidence small angle x-ray scattering

2018 ◽  
Author(s):  
Guillaume Freychet ◽  
Patrick Naulleau ◽  
Ronald Pandolfi ◽  
Dinesh Kumar ◽  
Joe Strzalka ◽  
...  
Keyword(s):  
Small Angle ◽  
Grazing Incidence ◽  
Critical Dimension ◽  
X Ray ◽  
X Ray Scattering ◽  
Ray Scattering

scholarly journals Estimation of Line Cross Sections Using Critical-Dimension Grazing-Incidence Small-Angle X-Ray Scattering

2019 ◽  
Vol 12 (4) ◽  
Author(s):  
Guillaume Freychet ◽  
Dinesh Kumar ◽  
Ron J. Pandolfi ◽  
Patrick Naulleau ◽  
Isvar Cordova ◽  
...  
Keyword(s):  
Cross Sections ◽  
Small Angle ◽  
Grazing Incidence ◽  
Critical Dimension ◽  
X Ray ◽  
X Ray Scattering ◽  
Line Cross ◽  
Ray Scattering

Determining the shape and periodicity of nanostructures using small-angle X-ray scattering

2015 ◽  
Vol 48 (5) ◽  
pp. 1355-1363 ◽  
Author(s):  
Daniel F. Sunday ◽  
Scott List ◽  
Jasmeet S. Chawla ◽  
R. Joseph Kline
Keyword(s):  
Small Angle ◽  
Semiconductor Industry ◽  
Three Dimensional ◽  
Critical Dimension ◽  
Dimensional Structure ◽  
Critical Dimensions ◽  
X Ray ◽  
Line Shapes ◽  
X Ray Scattering ◽  
Ray Scattering

The semiconductor industry is exploring new metrology techniques capable of meeting the future requirement to characterize three-dimensional structure where the critical dimensions are less than 10 nm. X-ray scattering techniques are one candidate owing to the sub-Å wavelengths which are sensitive to internal changes in electron density. Critical-dimension small-angle X-ray scattering (CDSAXS) has been shown to be capable of determining the average shape of a line grating. Here it is used to study a set of line gratings patternedviaa self-aligned multiple patterning process, which resulted in a set of mirrored lines, where the individual line shapes were asymmetric. The spacing between lines was systematically varied by sub-nm shifts. The model used to simulate the scattering was developed in stages of increasing complexity in order to justify the large number of parameters included. Comparisons between the models at different stages of development demonstrate that the measurement can determine differences in line shapes within the superlattice. The shape and spacing between lines within a given set were determined to sub-nm accuracy. This demonstrates the potential for CDSAXS as a high-resolution nanostructure metrology tool.

Small-angle x-ray scattering measurement of a mist of ethanol nanodroplets: An approach to understanding ultrasonic separation of ethanol-water mixtures

2007 ◽  
Vol 127 (3) ◽  
pp. 031101 ◽  
Author(s):  
Yohko F. Yano ◽  
Kazuo Matsuura ◽  
Tetsuo Fukazu ◽  
Fusatsugu Abe ◽  
Akihiro Wakisaka ◽  
...  
Keyword(s):  
Small Angle ◽  
X Ray ◽  
X Ray Scattering ◽  
Scattering Measurement ◽  
Ray Scattering
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