X-ray Metrology for the SemiconductorIndustry Tutorial

The semiconductor industry is in need of new, in-line dimensional metrology methods with higherspatial resolution for characterizing their next generation nanodevices. The purpose of this short course is to train the semiconductor industry on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS) method. The topics will include both data processing and instrumentation. The short course will also provide an opportunity for discussion of the requirements for CDSAXS and the necessary improvements in X-ray source technology. Expected audience include semiconductor manufacturers, equipment manufacturers, and component manufacturers. The presentations were made at “X-ray Metrology for the Semiconductor Industry” short course at the National Institute of Standards and Technology on Aug. 25, 2016.

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Determining the shape and periodicity of nanostructures using small-angle X-ray scattering

Journal of Applied Crystallography ◽

10.1107/s1600576715013369 ◽

2015 ◽

Vol 48 (5) ◽

pp. 1355-1363 ◽

Cited By ~ 32

Author(s):

Daniel F. Sunday ◽

Scott List ◽

Jasmeet S. Chawla ◽

R. Joseph Kline

Keyword(s):

Small Angle ◽

Semiconductor Industry ◽

Three Dimensional ◽

Critical Dimension ◽

Dimensional Structure ◽

Critical Dimensions ◽

X Ray ◽

Line Shapes ◽

X Ray Scattering ◽

Ray Scattering

The semiconductor industry is exploring new metrology techniques capable of meeting the future requirement to characterize three-dimensional structure where the critical dimensions are less than 10 nm. X-ray scattering techniques are one candidate owing to the sub-Å wavelengths which are sensitive to internal changes in electron density. Critical-dimension small-angle X-ray scattering (CDSAXS) has been shown to be capable of determining the average shape of a line grating. Here it is used to study a set of line gratings patternedviaa self-aligned multiple patterning process, which resulted in a set of mirrored lines, where the individual line shapes were asymmetric. The spacing between lines was systematically varied by sub-nm shifts. The model used to simulate the scattering was developed in stages of increasing complexity in order to justify the large number of parameters included. Comparisons between the models at different stages of development demonstrate that the measurement can determine differences in line shapes within the superlattice. The shape and spacing between lines within a given set were determined to sub-nm accuracy. This demonstrates the potential for CDSAXS as a high-resolution nanostructure metrology tool.

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The new NCPSS BL19U2 beamline at the SSRF for small-angle X-ray scattering from biological macromolecules in solution

Journal of Applied Crystallography ◽

10.1107/s160057671601195x ◽

2016 ◽

Vol 49 (5) ◽

pp. 1428-1432 ◽

Cited By ~ 22

Author(s):

Na Li ◽

Xiuhong Li ◽

Yuzhu Wang ◽

Guangfeng Liu ◽

Ping Zhou ◽

...

Keyword(s):

Data Processing ◽

Small Angle ◽

Dynamic Range ◽

Silicon Crystal ◽

High Dynamic Range ◽

Biological Macromolecules ◽

Shanghai Synchrotron Radiation Facility ◽

X Ray ◽

X Ray Scattering ◽

Ray Scattering

The beamline BL19U2 is located in the Shanghai Synchrotron Radiation Facility (SSRF) and is its first beamline dedicated to biological material small-angle X-ray scattering (BioSAXS). The electrons come from an undulator which can provide high brilliance for the BL19U2 end stations. A double flat silicon crystal (111) monochromator is used in BL19U2, with a tunable monochromatic photon energy ranging from 7 to 15 keV. To meet the rapidly growing demands of crystallographers, biochemists and structural biologists, the BioSAXS beamline allows manual and automatic sample loading/unloading. A Pilatus 1M detector (Dectris) is employed for data collection, characterized by a high dynamic range and a short readout time. The highly automated data processing pipeline SASFLOW was integrated into BL19U2, with help from the BioSAXS group of the European Molecular Biology Laboratory (EMBL, Hamburg), which provides a user-friendly interface for data processing. The BL19U2 beamline was officially opened to users in March 2015. To date, feedback from users has been positive and the number of experimental proposals at BL19U2 is increasing. A description of the new BioSAXS beamline and the setup characteristics is given, together with examples of data obtained.

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SGTools: a suite of tools for processing and analyzing large data sets from in situ X-ray scattering experiments

Journal of Applied Crystallography ◽

10.1107/s1600576721012267 ◽

2022 ◽

Vol 55 (1) ◽

Author(s):

Nie Zhao ◽

Chunming Yang ◽

Fenggang Bian ◽

Daoyou Guo ◽

Xiaoping Ouyang

Keyword(s):

Data Processing ◽

Small Angle ◽

Large Data ◽

Large Data Sets ◽

Data Sets ◽

X Ray ◽

Intensity Mapping ◽

X Ray Scattering ◽

Ray Scattering

In situ synchrotron small-angle X-ray scattering (SAXS) is a powerful tool for studying dynamic processes during material preparation and application. The processing and analysis of large data sets generated from in situ X-ray scattering experiments are often tedious and time consuming. However, data processing software for in situ experiments is relatively rare, especially for grazing-incidence small-angle X-ray scattering (GISAXS). This article presents an open-source software suite (SGTools) to perform data processing and analysis for SAXS and GISAXS experiments. The processing modules in this software include (i) raw data calibration and background correction; (ii) data reduction by multiple methods; (iii) animation generation and intensity mapping for in situ X-ray scattering experiments; and (iv) further data analysis for the sample with an order degree and interface correlation. This article provides the main features and framework of SGTools. The workflow of the software is also elucidated to allow users to develop new features. Three examples are demonstrated to illustrate the use of SGTools for dealing with SAXS and GISAXS data. Finally, the limitations and future features of the software are also discussed.

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