Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides
2018 ◽
Vol 7
(5)
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pp. X3-X3
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2010 ◽
Vol 7
(5)
◽
pp. 587-594
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2015 ◽
Vol 41
◽
pp. S191-S196
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Keyword(s):
Keyword(s):
2018 ◽
Vol 59
(9)
◽
pp. 86
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Keyword(s):