Effect of post-deposition annealing on the microstructure and optical properties of silicon films (Conference Presentation)

2018 ◽  
Author(s):  
Baojian Liu ◽  
Weibo Duan ◽  
Daqi Li ◽  
Deming Yu ◽  
Dingquan Liu
Keyword(s):  
Optical Properties ◽  
Silicon Films ◽  
Post Deposition Annealing ◽  
Post Deposition

Control of crystal structure, morphology and optical properties of ceria films by post deposition annealing treatments

2016 ◽  
Vol 603 ◽  
pp. 363-370 ◽  
Author(s):  
Asmaa Eltayeb ◽  
Rajani K. Vijayaraghavan ◽  
Anthony P. McCoy ◽  
Joseph Cullen ◽  
Stephen Daniels ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Optical Properties ◽  
Post Deposition Annealing ◽  
Structure Morphology ◽  
Post Deposition

Effect of post deposition annealing on the optical properties of HfOxNy films

2006 ◽  
Vol 88 (19) ◽  
pp. 192904 ◽  
Author(s):  
M. Liu ◽  
Q. Fang ◽  
G. He ◽  
L. Li ◽  
L. Q. Zhu ◽  
...  
Keyword(s):  
Optical Properties ◽  
Post Deposition Annealing ◽  
Post Deposition

Effect of Post-Deposition Annealing on some Optical Properties of Thermally-Evaporated V2O5 Thin Film

2012 ◽  
Vol 329 ◽  
pp. 139-145
Author(s):  
S.A. Aly
Keyword(s):  
Optical Properties ◽  
Amorphous State ◽  
X Ray Diffraction ◽  
Post Deposition Annealing ◽  
X Ray ◽  
Spectral Behaviour ◽  
Before And After ◽  
Different Temperatures ◽  
Reflectance Measurements ◽  
Post Deposition

A Vanadium Pentoxide Sample with a Film Thickness of 75 Nm Has Been Thermally Evaporated on Unheated Glass Substrate Using V2O5High Purity Powder. the Sample Was Subjected to a Subsequent Post-Deposition Annealing in Air at Different Temperatures for a Period of One Hour. the Optical Properties Were Studied by Transmittance and Reflectance Measurements. the Integrated Visible ,TVis, and Solar, TSol, Transmittance Were Calculated. the Spectral Behaviour of the Refractive Index as Well as the Absorption Coefficient before and after Post-Deposition Heat-Treatment Was Also Reported. X-Ray Diffraction Confirmed that the Film in the as-Deposited as Well as after Annealing up to 400 °C Is in the Amorphous State.

Post-Deposition Annealing and Hydrogenation of Hot-Wire Amorphous and Microcrystalline Silicon Films

1996 ◽  
Vol 452 ◽  
Author(s):  
J. P. Conde ◽  
P. Brogueira ◽  
V. Chu
Keyword(s):  
Electron Cyclotron Resonance ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Post Deposition Annealing ◽  
Ecr Plasma ◽  
Hydrogen Plasmas ◽  
Post Deposition

AbstractAmorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition were submitted to thermal annealing and to RF and electron-cyclotron resonance (ECR) hydrogen plasmas. Although the transport properties of the films did not change after these post-deposition treatments, the power density of a Ar+ laser required to crystallize the amorphous silicon films was significantly lowered by the exposure of the films to a hydrogen plasma. This decrease was dependent on the type of hydrogen plasma used, being the strongest for an ECR plasma with the substrate held at a negative bias, followed by an ECR hydrogen plasma with the substrate electrode grounded, and finally by an RF hydrogen plasma.

scholarly journals Effects of Substrate and Post‐Deposition Annealing on Structural and Optical Properties of (ZnO) 1− x (GaN) x Films

2019 ◽  
Vol 256 (6) ◽  
pp. 1800529 ◽  
Author(s):  
Vegard S. Olsen ◽  
Calliope Bazioti ◽  
Gustavo Baldissera ◽  
Alexander Azarov ◽  
Øystein Prytz ◽  
...  
Keyword(s):  
Optical Properties ◽  
Structural And Optical Properties ◽  
Post Deposition Annealing ◽  
Post Deposition
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