Experimental investigation of high power inductively coupled plasma etching of fused silica at atmospheric pressure

2020 ◽  
Author(s):  
Xiaoqiang Zhang ◽  
Yuancheng Sun ◽  
Xiurong Du ◽  
Xuefu Song
Keyword(s):  
Experimental Investigation ◽  
Plasma Etching ◽  
High Power ◽  
Atmospheric Pressure ◽  
Inductively Coupled Plasma ◽  
Fused Silica ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively Coupled Plasma Modified Silica Material Technology Research

2013 ◽  
Vol 483 ◽  
pp. 47-50
Author(s):  
Li Li ◽  
Ying Qian Jia ◽  
Jian Li Zhao ◽  
Yan Yan Gao
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Damage Threshold ◽  
Fused Silica ◽  
Material Technology ◽  
Resistance Level ◽  
Damage Resistance ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled ◽  
Silica Material

The using inductively coupled plasma etching techniques, the surface of fused silica was etched by CF4 as etching reaction gases. The results show that the fused silica surface scratches buried defects can be effectively removed with no replication effect, with the etching process proceeds, fused silica at 355nm laser light R: 1 under irradiated, the initial damage threshold of component surface is worth to an effective improved, damage resistance level of element surface more balanced, low damage threshold is worth to significantly improve.

Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer

2015 ◽  
Vol 355 ◽  
pp. 1180-1185 ◽  
Author(s):  
Xiaolong Jiang ◽  
Ying Liu ◽  
Zhengkun Liu ◽  
Keqiang Qiu ◽  
Xiangdong Xu ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Fused Silica ◽  
Subsurface Damage ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled ◽  
Damage Layer

Inductively coupled plasma etching for delineation of InAs/GaSb pixels

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography

2009 ◽  
Vol 517 (14) ◽  
pp. 3859-3861 ◽  
Author(s):  
Byung-Jae Kim ◽  
Hyunjung Jung ◽  
Hong-Yeol Kim ◽  
Joona Bang ◽  
Jihyun Kim
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Nanosphere Lithography ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Factors Affecting the Top Stripping of GaAs Microwire Array Fabricated by Inductively Coupled Plasma Etching

2015 ◽  
Vol 32 (5) ◽  
pp. 058102 ◽  
Author(s):  
Ying Cheng ◽  
Ji-Jun Zou ◽  
Ming Wan ◽  
Wei-Lu Wang ◽  
Xin-Cun Peng ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Factors Affecting ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
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