Characterization of tungsten silicide (WSix) film grown by chemical vapor deposition (CVD)

2015 ◽

Vol 32 (6) ◽

pp. 638

Author(s):

Xingmin Cai ◽

Xiaoqiang Su ◽

Fan Ye ◽

Huan Wang ◽

Guangxing Liang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth

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Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates

Applied Physics Express ◽

10.35848/1882-0786/ab9a8f ◽

2020 ◽

Vol 13 (7) ◽

pp. 075505

Author(s):

Tomohiro Yamaguchi ◽

Hiroki Nagai ◽

Takanori Kiguchi ◽

Nao Wakabayashi ◽

Takuto Igawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth ◽

Α Al2o3

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Chemical Vapor Deposition Synthesis and Characterization of Hollow Carbon Nanospheres with High Specific Capacitance and Excellent Cycling Stability

Journal of Electronic Materials ◽

10.1007/s11664-021-08818-7 ◽

2021 ◽

Author(s):

Mehrdad Teymourzadeh ◽

Majid Seifi ◽

Mohammad Bagher Askari

Keyword(s):

Chemical Vapor Deposition ◽

Specific Capacitance ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Specific Capacitance ◽

Synthesis And Characterization ◽

Carbon Nanospheres ◽

Excellent Cycling Stability ◽

Hollow Carbon

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Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET

Journal of Electronic Materials ◽

10.1007/s11664-021-09038-9 ◽

2021 ◽

Author(s):

A. Ramos-Carrazco ◽

J. A. Gallardo-Cubedo ◽

A. Vera-Marquina ◽

A. L. Leal-Cruz ◽

J. R. Noriega ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Active Layer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Zno Films

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Surface characterization of mesoporous biomass activated carbon modified by thermal chemical vapor deposition and adsorptive mechanism of nitrate ions in aqueous solution

Colloids and Surfaces A Physicochemical and Engineering Aspects ◽

10.1016/j.colsurfa.2021.126213 ◽

2021 ◽

pp. 126213

Author(s):

Jinghan Yuan ◽

Yoshimasa Amano ◽

Motoi Machida

Keyword(s):

Aqueous Solution ◽

Activated Carbon ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Surface Characterization ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Nitrate Ions ◽

Adsorptive Mechanism

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Characterization of Microcrystalline Silicon Thin Film Solar Cells Prepared by High Working Pressure Plasma-enhanced Chemical Vapor Deposition

2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) ◽

10.1109/pvsc.2017.8366297 ◽

2017 ◽

Author(s):

Jung-Dae Kwon ◽

Dong-Ho Kim ◽

Ji-Hoon Lee ◽

Myungkwan Song ◽

Myunghun Shin

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thin Film Solar Cells ◽

Microcrystalline Silicon ◽

Silicon Thin Film ◽

Working Pressure ◽

High Working Pressure

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Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1470510 ◽

2002 ◽

Vol 20 (3) ◽

pp. 828 ◽

Cited By ~ 12

Author(s):

Hongqiang Lu ◽

Hao Cui ◽

Ishwara Bhat ◽

Shyam Murarka ◽

Williams Lanford ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Oxide Film ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Silicon Oxide Film ◽

Doped Silicon ◽

Deposition Technology

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Characterization of Undoped, N- and P-Type Hydrogenated Nanocrystalline Silicon Carbide Films Deposited by Hot-Wire Chemical Vapor Deposition at Low Temperatures

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.1415 ◽

2007 ◽

Vol 46 (4A) ◽

pp. 1415-1426 ◽

Cited By ~ 46

Author(s):

Shinsuke Miyajima ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Nanocrystalline Silicon Carbide ◽

P Type

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ChemInform Abstract: Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199406262 ◽

2010 ◽

Vol 25 (6) ◽

pp. no-no

Author(s):

X.-L. XU ◽

P. K. MCLARTY ◽

H. BRUSH ◽

V. MISRA ◽

J. J. WORTMAN ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Oxynitride ◽

Thermal Chemical Vapor Deposition ◽

Abstract Characterization ◽

Thin Silicon

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Chemical Vapor Deposition and Characterization of Aligned and Incommensurate Graphene/Hexagonal Boron Nitride Heterostack on Cu(111)

Nano Letters ◽

10.1021/nl400815w ◽

2013 ◽

Vol 13 (6) ◽

pp. 2668-2675 ◽

Cited By ~ 90

Author(s):

Silvan Roth ◽

Fumihiko Matsui ◽

Thomas Greber ◽

Jürg Osterwalder

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Hexagonal Boron Nitride ◽

Chemical Vapor

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Characterization of tungsten silicide (WSix) film grown by chemical vapor deposition (CVD)

Chemical vapor deposition growth and characterization of AlGaN nanowires

Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates

Chemical Vapor Deposition Synthesis and Characterization of Hollow Carbon Nanospheres with High Specific Capacitance and Excellent Cycling Stability

Characterization of ZnO Films Grown by Chemical Vapor Deposition as Active Layer in Pseudo-MOSFET

Surface characterization of mesoporous biomass activated carbon modified by thermal chemical vapor deposition and adsorptive mechanism of nitrate ions in aqueous solution

Characterization of Microcrystalline Silicon Thin Film Solar Cells Prepared by High Working Pressure Plasma-enhanced Chemical Vapor Deposition

Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology

Characterization of Undoped, N- and P-Type Hydrogenated Nanocrystalline Silicon Carbide Films Deposited by Hot-Wire Chemical Vapor Deposition at Low Temperatures

ChemInform Abstract: Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition.

Chemical Vapor Deposition and Characterization of Aligned and Incommensurate Graphene/Hexagonal Boron Nitride Heterostack on Cu(111)

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