Integration of optical inspection and metrology functions into DUV femtosecond laser repair tool for large area FPD photomasks

2007 ◽  
Author(s):  
Leon Treyger ◽  
Jon Heyl ◽  
Donald Ronning ◽  
Donald Ducharme
2018 ◽  
Vol 55 ◽  
pp. 187-193 ◽  
Author(s):  
Jun'ya Tsutsumi ◽  
Satoshi Matsuoka ◽  
Toshihide Kamata ◽  
Tatsuo Hasegawa

2010 ◽  
Vol 154-155 ◽  
pp. 490-493
Author(s):  
Dong Qing Yuan ◽  
Jian Ting Xu

The periodic microstructures on 65Mn plate were induced by the irradiation of the femtosecond laser with the laser wavelength of 800 nm and the pulse length of 130 fs. The parallel periodic ripples structures were observed at the laser fluence of 1 J/cm2 with different pulses number( N=5,50,400,800) which lied parallel to the laser electric polarization field vector. For 400 pulses, the nano-holes arrays were generated to interrupt the consistent ripples structures.For 800 pulses, initial nano-holes evolution to the grooves, which the direction were uncertainly. Further experiments have been made to induce large area consitent ripple structures by scanning, at the laser fluence of 1 J/cm2 with speed v=500μm/s. 2D arrays were induced by accurate processing control


2021 ◽  
Vol 2021 ◽  
pp. 1-22
Author(s):  
Zhenyuan Lin ◽  
Minghui Hong

As a noncontact strategy with flexible tools and high efficiency, laser precision engineering is a significant advanced processing way for high-quality micro-/nanostructure fabrication, especially to achieve novel functional photoelectric structures and devices. For the microscale creation, several femtosecond laser fabrication methods, including multiphoton absorption, laser-induced plasma-assisted ablation, and incubation effect have been developed. Meanwhile, the femtosecond laser can be combined with microlens arrays and interference lithography techniques to achieve the structures in submicron scales. Down to nanoscale feature sizes, advanced processing strategies, such as near-field scanning optical microscope, atomic force microscope, and microsphere, are applied in femtosecond laser processing and the minimum nanostructure creation has been pushed down to ~25 nm due to near-field effect. The most fascinating femtosecond laser precision engineering is the possibility of large-area, high-throughput, and far-field nanofabrication. In combination with special strategies, including dual femtosecond laser beam irradiation, ~15 nm nanostructuring can be achieved directly on silicon surfaces in far field and in ambient air. The challenges and perspectives in the femtosecond laser precision engineering are also discussed.


2020 ◽  
Vol 130 ◽  
pp. 106330 ◽  
Author(s):  
Yan Ou ◽  
Sheng Li ◽  
Jinwen Qian ◽  
Yifeng Xiao ◽  
Siyi Fu ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document