Simulating the chlorine plasma etching profile of high-aspect-ratio trenches in Si
2019 ◽
Vol 37
(3)
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pp. 031304
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Keyword(s):
2010 ◽
Vol 49
(4)
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pp. 04DB14
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Keyword(s):
2017 ◽
Vol 26
(1)
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pp. 135-142
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