Effect of an External Magnetic Field on the Absorption Efficiency of the RF Power in a Spatially Bounded Inductive Plasma Source

2018 ◽  
Vol 44 (9) ◽  
pp. 878-881
Author(s):  
P. A. Nekliudova ◽  
E. A. Kralkina ◽  
K. V. Vavilin ◽  
I. I. Zadiriyev ◽  
A. M. Nikonov
Keyword(s):  
Magnetic Field ◽  
External Magnetic Field ◽  
Plasma Source ◽  
Absorption Efficiency ◽  
Rf Power

Plasma parameters in a twin-chamber RF inductive plasma source, placed in a weak external magnetic field

Vacuum ◽  
2019 ◽  
Vol 169 ◽  
pp. 108927 ◽  
Author(s):  
A.K. Petrov ◽  
E.A. Kralkina ◽  
A.M. Nikonov ◽  
K.V. Vavilin ◽  
I.I. Zadiriev
Keyword(s):  
Magnetic Field ◽  
External Magnetic Field ◽  
Plasma Source ◽  
Plasma Parameters

Structure of RF fields in a twin-chamber radio-frequency inductive plasma source placed in a weak external magnetic field

Vacuum ◽  
2020 ◽  
Vol 181 ◽  
pp. 109634
Author(s):  
A.K. Petrov ◽  
E.A. Kralkina ◽  
A.M. Nikonov ◽  
K.V. Vavilin ◽  
I.I. Zadiriev
Keyword(s):  
Magnetic Field ◽  
External Magnetic Field ◽  
Radio Frequency ◽  
Plasma Source

Self-consistent model of an inductive RF plasma source in an external magnetic field

2004 ◽  
Vol 30 (5) ◽  
pp. 398-412 ◽  
Author(s):  
A. F. Aleksandrov ◽  
G. É. Bugrov ◽  
K. V. Vavilin ◽  
I. F. Kerimova ◽  
S. G. Kondranin ◽  
...  
Keyword(s):  
Magnetic Field ◽  
External Magnetic Field ◽  
Plasma Source ◽  
Rf Plasma ◽  
Consistent Model ◽  
Self Consistent

scholarly journals Physical processes in a low-power inductive plasma source in the presence of a weak magnetic field

2021 ◽  
pp. 38-43
Author(s):  
Phedor Ivandikov ◽  
Ilya Zadiriev ◽  
Elena Kralkina
Keyword(s):  
Magnetic Field ◽  
External Magnetic Field ◽  
Magnetic Fields ◽  
Low Power ◽  
Weak Magnetic Field ◽  
Discharge Plasma ◽  
Plasma Source ◽  
Axial Component ◽  
Physical Processes ◽  
Power Coupling

Research into the influence of a weak external magnetic field (<150 G) on the efficiency of power coupling to plasma and on the structure of axial RF fields in plasma is presented. Power coupling to the discharge plasma as well as the structure of the axial component of RF magnetic fields are shown to depend on the external magnetic field’s magnitude in a nonmonotous manner.

scholarly journals RF power absorption by plasma of low pressure low power inductive discharge located in the external magnetic field

AIP Advances ◽  
2018 ◽  
Vol 8 (3) ◽  
pp. 035217 ◽  
Author(s):  
E. A. Kralkina ◽  
A. A. Rukhadze ◽  
P. A. Nekliudova ◽  
V. B. Pavlov ◽  
A. K. Petrov ◽  
...  
Keyword(s):  
Magnetic Field ◽  
External Magnetic Field ◽  
Low Power ◽  
Low Pressure ◽  
Rf Power ◽  
Power Absorption ◽  
Inductive Discharge

Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing

2007 ◽  
Vol 124-126 ◽  
pp. 271-274
Author(s):  
Jong Hyeuk Lim ◽  
Kyong Nam Kim ◽  
Geun Young Yeom
Keyword(s):  
Magnetic Field ◽  
Permanent Magnets ◽  
Impedance Matching ◽  
Plasma Source ◽  
Q Factor ◽  
Rf Power ◽  
Large Area ◽  
Plasma System ◽  
Polar Magnetic Field ◽  
Plasma Characteristics

An internal linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880mm × 660mm and the effects of multi-polar magnetic field applied by inserting permanent magnets parallel to the linear internal antennas on the plasma characteristics were investigated. By applying the multi-polar magnetic field, high density plasmas on the order of 3.2 × 1011-3 which is 50% higher than that obtained for the source without multi-polar magnetic field could be obtained at the RF power of 5000W. Also stable impedance matching with a low Q-factor of the plasma system could be obtained. The application of the multi-polar magnetic field not only increased the plasma density but also improved the plasma uniformity (less than 3%) within the 880mm × 660mm processing area.

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