STUDY OF TRAPPING RATE AND DEFECT DENSITY IN AlSi11.35Mg0.23 BY POSITRON ANNIHILATION TECHNIQUE
2004 ◽
Vol 11
(04n05)
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pp. 427-432
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Keyword(s):
The measurements of Positron Annihilation Lifetime Technique (PALT) have been performed on AlSi 11.35 Mg 0.23 Alloys. It has been shown that positrons can become trapped at imperfect locations in solids and their mean lifetime can be influenced by changes in the concentration of such defects. No change has been observed in the mean lifetime values at the saturation of defect concentration. The trapping rates of positrons can be determined for thickness reduction up to 11% for dislocation. The concentration of defect (ρ') range varies from 8.65×1015 to 2.35×1018 cm -3 up to the maximum value of strain (ε) 0.23.
2005 ◽
Vol 12
(03)
◽
pp. 463-468
◽
2007 ◽
Vol 261-262
◽
pp. 55-60
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2005 ◽
Vol 19
(22)
◽
pp. 3475-3482
1978 ◽
Vol 33
(11)
◽
pp. 1294-1306
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2005 ◽
Vol 12
(04)
◽
pp. 545-547
◽
2005 ◽
Vol 12
(01)
◽
pp. 1-6
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2011 ◽
Vol 316-317
◽
pp. 119-126
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2010 ◽
Vol 303-304
◽
pp. 107-112