THE EFFECT OF DEGRADATION OF DEPTH RESOLUTION ON THE INTERDIFFUSION DATA IN THIN POLYCRYSTALLINE Au-Ag MULTILAYER FILMS

1995 ◽  
Vol 02 (02) ◽  
pp. 191-196 ◽  
Author(s):  
ANTONI BUKALUK
Keyword(s):  
Electron Spectroscopy ◽  
Auger Electron ◽  
Depth Resolution ◽  
Multilayer Films ◽  
Multilayer System ◽  
Ion Sputtering ◽  
Thin Polycrystalline ◽  
Interdiffusion Coefficients ◽  
Argon Ion ◽  
Diffusion Profiles

Auger electron spectroscopy (AES) in conjunction with argon-ion sputtering was used to determine the diffusion profiles in the thin-film Au-Ag multilayer system. Interdiffusion coefficients, obtained in the temperature range of 175–250°C, have been derived from the change of the concentration amplitude of the structure and from the variation of the composition at the interface of two consecutive layers of the multilayer system. The influence of the depth resolution on the diffusion data have been analyzed and discussed.

Auger Electron Spectroscopy and Its Application to Nanotechnology

2011 ◽  
Vol 19 (2) ◽  
pp. 12-15 ◽  
Author(s):  
S. N. Raman ◽  
D. F. Paul ◽  
J. S. Hammond ◽  
K. D. Bomben
Keyword(s):  
Electron Microscopy ◽  
Auger Electron Spectroscopy ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Imaging Techniques ◽  
Chemical Characterization ◽  
Depth Resolution ◽  
Surface Modifications ◽  
Transmission Electron ◽  
Nanoscale Characterization

Over the past decade, the field of nanotechnology has expanded, and the most heavily used nanoscale characterization/imaging techniques have been scanning probe microscopy (SPM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Although these high-resolution imaging techniques help visualize nanostructures, it is essential to understand the chemical nature of these materials and their growth mechanisms. Surface modifications in the first few nanometers can alter the bulk properties of these nanostructures, and conventional characterization techniques, including energy dispersive spectroscopy (EDS) and electron energy loss spectroscopy (EELS) associated with SEM and TEM are not suited to detecting these surface modifications except in special, favorable specimens. A modern state-of-the-art scanning Auger electron spectroscopy (AES) instrument provides valuable elemental and chemical characterization of nanostructures with a lateral spatial resolution better than 10 nm and a depth resolution of a few nm. In this article we review the technique of scanning AES and highlight its unique analytical capabilities in the areas of nanotechnology, metallurgy, and semiconductors.

High Spatial Resolution Auger Electron Spectroscopy

1972 ◽  
Vol 30 ◽  
pp. 366-367
Author(s):  
Noel C. MacDonald
Keyword(s):  
Auger Electron Spectroscopy ◽  
Electron Spectroscopy ◽  
Composite Structures ◽  
Auger Electron ◽  
Electron Distribution Function ◽  
Depth Resolution ◽  
Reference Source ◽  
Secondary Electrons ◽  
Practical Applications ◽  
Sputter Etching

During the past several years, Auger electron spectroscopy (AES) has developed from a research curiosity to a practical surface chemical analysis technique. The practical applications of AES have been further increased by combining AES with simultaneous ion sputter etching; this powerful combination of AES and sputter etching is now routinely used to chemical profile thin film and other composite structures with a depth resolution of 10 - 50 Å. AES is sensitive to all elements except hydrogen and helium, and spectra for the majority of the elements are now cataloged in one reference source.AES is performed by electron bombarding a solid surface and energy analyzing the resulting secondary electrons. The secondary electrons that have undergone Auger transitions produce small peaks in the secondary electron distribution function, and the positions of these peaks in energy are used to identify the elements producing the transitions.

CORROSION STUDY OF A Zn–22Al–2Cu ALLOY WITH THE SURFACE MODIFIED BY AN Y2O3 THIN FILM

2002 ◽  
Vol 09 (05n06) ◽  
pp. 1697-1701
Author(s):  
R. GUERRERO-PENALVA ◽  
M. H. FARIAS ◽  
L. COTA-ARAIZA
Keyword(s):  
Thin Film ◽  
Corrosion Resistance ◽  
Potentiodynamic Polarization ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Ion Sputtering ◽  
Depth Profiles ◽  
Electrochemical Parameters ◽  
Surface Modified ◽  
Deposited Film

Samples of Zn–22Al–2Cu (zinalco) alloys with and without a thin film of Y 2 O 3 were submitted to corrosion by potentiodynamic polarization and analyzed by means of Tafel extrapolation. In addition, in-depth profiles by Ar ion sputtering and Auger electron spectroscopy were obtained. Samples with Y 2 O 3-deposited film and subjected to potentiodynamic polarization present an improvement in corrosion resistance up to 75% in pH = 4.5 aerated water as compared to samples without the Y 2 O 3 deposit. The variations in electrochemical parameters are explained by the spectroscopic in-depth profile measurements.

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