Development of quasi-two-dimensional Nb2O5 nanoflakes with thickness-depended electro-chemical properties

2015 ◽  
Vol 08 (01) ◽  
pp. 1550007 ◽  
Author(s):  
Serge Zhuiykov ◽  
Eugene Kats ◽  
Tomoaki Sato ◽  
Hiroshi Ikeda ◽  
Norio Miura

Quasi-two-dimensional (Q2D) Nb 2 O 5 nanoflakes were synthesized by combined sol–gel/exfoliation method with the average thickness of 10–25 nm. Their structural, surface- and electro-chemical properties were closely studied and analyzed by X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy (SEM), conductive atomic force microscopy (AFM), Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy techniques.

2016 ◽  
Vol 689 ◽  
pp. 55-59
Author(s):  
Serge Zhuiykov

Electrical properties and morphology of orthorhombic β–WO3 nano-flakes with thickness of ~7-9 nm were investigated at the nanoscale using energy dispersive X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and current sensing force spectroscopy atomic force microscopy (CSFS-AFM, or PeakForce TUNATM). CSFS-AFM analysis established good correlation between the topography of the developed nanostructures and various features of WO3 nano-flakes synthesized via a two-step sol-gel-exfoliation method. It was determined that β–WO3 nano-flakes annealed at 550°C possess distinguished and exceptional thickness-dependent properties in comparison with the bulk, micro- and nano-structured WO3 synthesized at alternative temperatures.


2010 ◽  
Vol 663-665 ◽  
pp. 401-404
Author(s):  
Feng Xiang Wang ◽  
Chang Kwon Hwangbo ◽  
Bu Yong Jung ◽  
Jun He Qi

TiO2 thin films were deposited from Ti2¬O3, TiO2 and Ti3O5 source materials by e-beam. The refractive index and extinction coefficient of the films in the visible and near infrared(IR) region were measured. The structural and chemical properties of the films were investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS). XRD measurements revealed that all the deposited films were amorphous. XPS analysis showed the films were stoichiometric TiO2. The AFM investigation confirmed that the surface roughness of the films was dependent on the deposition conditions.


2011 ◽  
Vol 356-360 ◽  
pp. 574-578
Author(s):  
Xiao Jing Li ◽  
Guan Jun Qiao ◽  
Jin Ren Ni

Nanometer titanium dioxide films supported on glass, quartz, molybdenum, and aluminum were prepared by sol-gel method. The loaded titanium dioxide films were characterized by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and photocatalytic degradation of aqueous crystal violet. The titanium dioxide films supported on different substrates were all composed of polycrystalline nanoparticles, which belonged to single-phase anatase, and displayed different morphology after sintering at 773 K for 1 h. Some elements in the substrate made of noncrystal appeared on the surface of titanium dioxide films. The experiment about basic crystal violet degradation displayed the photocatalysis activity of titanium oxide films supported on the molybdenum was better.


2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.


2021 ◽  
Vol 11 (5) ◽  
pp. 706-716
Author(s):  
Nada D. Al-Khthami ◽  
Tariq Altalhi ◽  
Mohammed Alsawat ◽  
Mohamed S. Amin ◽  
Yousef G. Alghamdi ◽  
...  

Different organic pollutants have been remediated photo catalytically by applying perovskite photocatalysts. Atrazine (ATR) is a pesticide commonly detected as a pollutant in drinking, surface and ground water. Herein, FeYO3@rGO heterojunction was synthesized and applied for photooxidation decomposition of ATR. First, FeYO 3nanoparticles (NPs) were prepared via routine sol-gel. After that, FeYO3 NPs were successfully incorporated with different percentages (5, 10, 15 and 20 wt.%) of reduced graphene oxide (rGO) in the synthesis of novel FeYO3@rGO photocatalyst. Morphological, structural, surface, optoelectrical and optical characteristics of constructed materials were identified via X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Transmission electron microscopy (TEM), adsorption/desorption isotherms, diffusive reflectance (DR) spectra, and photoluminescence response (PL). Furthermore, photocatalytic achievement of the constructed materials was evaluated via photooxidative degradation of ATR. Various investigations affirmed the usefulness of rGO incorporation on the advancement of formed photocatalysts. Actually, novel nanocomposite containing rGO (15 wt.%) possessed diminished bandgap energy, as well as magnified visible light absorption. Furthermore, such nanocomposite presented exceptional photocatalytic achievement when exposed to visible light as ATR was perfectly photooxidized over finite amount (1.6 g · L-1) from the optimized photocatalyst when illuminated for 30 min. The advanced photocatalytic performance of constructed heterojunctions could be accredited mainly to depressed recombination amid induced charges. The constructed FeYO3@rGO nanocomposite is labelled as efficient photocatalyst for remediation of herbicides from aquatic environments.


2013 ◽  
Vol 28 (2) ◽  
pp. 68-71 ◽  
Author(s):  
Thomas N. Blanton ◽  
Debasis Majumdar

In an effort to study an alternative approach to make graphene from graphene oxide (GO), exposure of GO to high-energy X-ray radiation has been performed. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM) have been used to characterize GO before and after irradiation. Results indicate that GO exposed to high-energy radiation is converted to an amorphous carbon phase that is conductive.


2019 ◽  
Vol 13 (26) ◽  
pp. 171-177
Author(s):  
Ban M. Al-Shabander

Titanium dioxide nanorods have been prepared by sol-gel templatemethod. The structural and surface morphology of the TiO2 nanorods wasinvestigated by X-ray diffraction (XRD) and atomic force microscopy(AFM), it was found that the nanorods produced were anatase TiO2 phase.The photocatalytic activity of the TiO2 nanorods was evaluated by thephoto degradation of methyl orange (MO). The relatively higherdegradation efficiency for MO (D%=78.2) was obtained after 6h of exposedto UV irradiation.


1999 ◽  
Vol 572 ◽  
Author(s):  
Stefan Zollner ◽  
Atul Konkar ◽  
R. B. Gregory ◽  
S. R. Wilson ◽  
S. A. Nikishin ◽  
...  

ABSTRACTWe measured the ellipsometric response from 0.7–5.4 eV of c-axis oriented AlN on Si (111) grown by molecular beam epitaxy. We determine the film thicknesses and find that for our AlN the refractive index is about 5–10% lower than in bulk AlN single crystals. Most likely, this discrepancy is due to a low film density (compared to bulk AlN), based on measurements using Rutherford backscattering. The films were also characterized using atomic force microscopy and x-ray diffraction to study the growth morphology. We find that AlN can be grown on Si (111) without buffer layers resulting in truely two-dimensional growth, low surface roughness, and relatively narrow x-ray peak widths.


1998 ◽  
Vol 05 (01) ◽  
pp. 387-392 ◽  
Author(s):  
D. Abriou ◽  
D. Gagnot ◽  
J. Jupille ◽  
F. Creuzet

The growth mode of silver films deposited at room temperature on TiO 2(110) surfaces has been examined by means of atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) in ultrahigh vacuum (UHV) conditions, On clean vacancy-free TiO 2(110) surfaces, 0.1-nm-thick (on average) Ag deposits form a two-dimensional (2D) layer. When the thickness of the silver overlayer is increased, 3D clusters are shown to appear while the 2D film is preserved, furthermore, the influence of surface oxygen vacancies on the growth of Ag/TiO 2(110) is evidenced by well-characterized differences in the morphology of 9-nm-thick silver deposits.


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