Formation of Abrupt Interfaces between Surface Silicon and Buried SiO2Layers by Very High Dose Oxygen-Ion Implantation
1980 ◽
Vol 19
(5)
◽
pp. 1005-1006
◽
1985 ◽
Vol 43
◽
pp. 300-301
1992 ◽
Vol 12
(1-2)
◽
pp. 199-203
◽
1989 ◽
Vol 115
◽
pp. 79-82
◽
Keyword(s):
1989 ◽
Vol 39
(1-4)
◽
pp. 215-219
◽
Keyword(s):
1985 ◽
Vol 22-23
◽
pp. 681-685
◽
Keyword(s):
1990 ◽
Vol 45
(1-4)
◽
pp. 110-114
◽
Keyword(s):
TEM, AES and XPS Studies of Si Layer on Buried SiO2Layer Formed by High-Dose Oxygen Ion-Implantation
1980 ◽
Vol 19
(6)
◽
pp. 1111-1116
◽