Formation of a Lead Zirconate Titanate (PZT)/Pt Interfacial Layer and Structural Changes in the Pt/Ti/SiO2/Si Substrate during the Deposition of PZT Thin Film by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition

Chemical Vapor ◽

Lead Zirconate ◽

Si Substrate ◽

Pzt Thin Film ◽

Composition Control of Lead Zirconate Titanate Thin Films in Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition System

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.2726 ◽

1996 ◽

Vol 35 (Part 1, No. 5A) ◽

pp. 2726-2730 ◽

Cited By ~ 3

Author(s):

Jae-Whan Kim ◽

Joong-Shik Shin ◽

Dang-Moon Wee ◽

Kwangsoo No ◽

Won-Jong Lee

Keyword(s):

Thin Films ◽

Lead Zirconate Titanate ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Lead Zirconate ◽

Composition Control ◽

Low Temperature Nucleation of the Perovskite Phase in the Deposition of Pb(Zr,Ti)O 3 Films on the Pt/SiO 2/Si Substrate by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l936 ◽

1997 ◽

Vol 36 (Part 2, No. 7B) ◽

pp. L936-L938

Author(s):

Jae-Whan Kim ◽

Hyun-Ho Kim ◽

Dang-Moon Wee ◽

Won-Jong Lee

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Perovskite Phase ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Si Substrate ◽

Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

c-Axis oriented AlN films prepared on diamond film substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(01)01810-3 ◽

2002 ◽

Vol 235 (1-4) ◽

pp. 333-339 ◽

Cited By ~ 7

Author(s):

H Gong ◽

X Jiang

Keyword(s):

Diamond Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Film Substrate ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

In situ investigation of the passivation of Si and Ge by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiO2

10.1116/1.589211 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1687 ◽

Cited By ~ 9

Author(s):

Y. Wang

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

In Situ Investigation ◽

Low‐temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114962 ◽

1995 ◽

Vol 67 (7) ◽

pp. 971-973 ◽

Cited By ~ 21

Author(s):

J. L. Rogers ◽

P. S. Andry ◽

W. J. Varhue ◽

P. McGaughnea ◽

E. Adams ◽

...

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Homoepitaxial Growth ◽

Preparation of Bismuth Titanate Films by Electron Cyclotron Resonance Plasma Sputtering-Chemical Vapor Deposition

Journal de Physique IV (Proceedings) ◽

10.1051/jphyscol:1995580 ◽

1995 ◽

Vol 05 (C5) ◽

pp. C5-671-C5-677

Author(s):

H. Masumoto ◽

T. Hirai

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Bismuth Titanate ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Sputtering ◽

Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Cited By ~ 8

Author(s):

OLEG A. POPOV

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Sources ◽

Characteristics of amorphous and polycrystalline silicon films deposited at 120 °C by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581195 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1912-1916 ◽

Cited By ~ 31

Author(s):

Sanghoon Bae ◽

A. Kaan Kalkan ◽

Shangcong Cheng ◽

Stephen J. Fonash

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Polycrystalline Silicon Films ◽

A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by r.f. plasma and by electron cyclotron resonance plasma

Thin Solid Films ◽

10.1016/s0040-6090(96)09098-0 ◽

1997 ◽

Vol 292 (1-2) ◽

pp. 124-129 ◽

Cited By ~ 9

Author(s):

Jong-Seok Kim ◽

Byung-Hyuk Jun ◽

Eung-Jik Lee ◽

Chan-Yong Hwang ◽

Won-Jong Lee

Keyword(s):

Comparative Study ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Tin Films ◽