Decrease in Deposition Rate and Improvement of Step Coverage by CF4Addition to Plasma-Enhanced Chemical Vapor Deposition of Silicon Oxide Films
2000 ◽
Vol 39
(Part 1, No. 1)
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pp. 330-336
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2003 ◽
Vol 444
(1-2)
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pp. 125-131
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Keyword(s):
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1985 ◽
Vol 132
(2)
◽
pp. 482-488
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Keyword(s):
2006 ◽
Vol 24
(2)
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pp. 291-295
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Keyword(s):
1985 ◽
Vol 3
(6)
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pp. 1604
◽
Keyword(s):
Keyword(s):
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1998 ◽
Vol 145
(8)
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pp. 2847-2853
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