Formation Mechanism of Strontium and Titanium Oxide Films by Metalorganic Chemical Vapor Deposition: An Isotopic Labeling Study Using18O2

Toshihiro Nakamura; Shun Momose; Kunihide Tachibana

doi:10.1143/jjap.40.6619

Formation Mechanism of Strontium and Titanium Oxide Films by Metalorganic Chemical Vapor Deposition: An Isotopic Labeling Study Using18O2

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.6619 ◽

2001 ◽

Vol 40 (Part 1, No. 11) ◽

pp. 6619-6622 ◽

Cited By ~ 9

Author(s):

Toshihiro Nakamura ◽

Shun Momose ◽

Kunihide Tachibana

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Formation Mechanism ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Isotopic Labeling ◽

Titanium Oxide Films ◽

Metalorganic Chemical

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NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l1448 ◽

1993 ◽

Vol 32 (Part 2, No. 10A) ◽

pp. L1448-L1450 ◽

Cited By ~ 51

Author(s):

Eiji Fujii ◽

Atsushi Tomozawa ◽

Satoru Fujii ◽

Hideo Torii ◽

Masumi Hattori ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Metalorganic Chemical

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Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl4/O2/N2Gas Mixtures

Plasma Science and Technology ◽

10.1088/1009-0630/16/7/11 ◽

2014 ◽

Vol 16 (7) ◽

pp. 695-700

Author(s):

Jinhai Niu ◽

Zhihui Zhang ◽

Hongyu Fan ◽

Qi Yang ◽

Dongping Liu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Dielectric Barrier Discharge ◽

Vapor Deposition ◽

Barrier Discharge ◽

Oxide Films ◽

Chemical Vapor ◽

Dielectric Barrier ◽

Titanium Oxide Films

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Evaluation of photocatalytic properties of titanium oxide films prepared by plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.05.007 ◽

2005 ◽

Vol 489 (1-2) ◽

pp. 320-324 ◽

Cited By ~ 30

Author(s):

Masahiko Maeda ◽

Teruyoshi Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Photocatalytic Properties ◽

Titanium Oxide Films

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Growth of Hafnium Oxide Films by Metalorganic Chemical Vapor Deposition Using Oxygen-Free Hf[N(C2H5)2]4 Precursor and Their Properties

Integrated Ferroelectrics ◽

10.1080/714040774 ◽

2003 ◽

Vol 57 (1) ◽

pp. 1185-1192

Author(s):

K. Takahashi ◽

M. Nakayama ◽

S. Hino ◽

E. Tokumitsu ◽

H. Funakubo

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Hafnium Oxide ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Metalorganic Chemical

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Room Temperature Fabrication of Thin Oxide Films by Laser Induced Metalorganic Chemical Vapor Deposition.

The Review of Laser Engineering ◽

10.2184/lsj.23.355 ◽

1995 ◽

Vol 23 (5) ◽

pp. 355-363 ◽

Cited By ~ 2

Author(s):

Koji TOKITA ◽

Fumio OKADA ◽

Hideo SEGAWA

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Thin Oxide Films ◽

Thin Oxide ◽

Metalorganic Chemical

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Photoconductive Characteristics of Hydro-Oxygenated Amorphous Titanium Oxide Films Prepared by Remote Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.4183 ◽

2006 ◽

Vol 45 (5A) ◽

pp. 4183-4186 ◽

Cited By ~ 7

Author(s):

Koichi Sakaguchi ◽

Koichi Shimakawa ◽

Yoshinori Hatanaka

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Remote Plasma ◽

Titanium Oxide Films

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Selective area chemical vapor deposition of titanium oxide films: Characterization of Ti(OC[sub 3]H[sub 7])[sub 4] as an electron beam resist

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590801 ◽

1999 ◽

Vol 17 (4) ◽

pp. 1622 ◽

Cited By ~ 8

Author(s):

William J. Mitchell ◽

Evelyn L. Hu

Keyword(s):

Electron Beam ◽

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Selective Area ◽

Titanium Oxide Films

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Resistive Switching in Metal Oxide Films Deposited by Metalorganic Chemical Vapor Deposition

ECS Transactions ◽

10.1149/1.3207678 ◽

2019 ◽

Vol 25 (8) ◽

pp. 865-869 ◽

Cited By ~ 3

Author(s):

Toshihiro Nakamura ◽

Keita Onogi ◽

Kohei Homma ◽

Kunihide Tachibana

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Resistive Switching ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Metal Oxide Films ◽

Metalorganic Chemical

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Formation Mechanism of Oriented Pb(Zr,Ti)O3Thin Films on Platinum Bottom Electrodes from Amorphous Films Prepared by Liquid Delivery Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.48.09ka02 ◽

2009 ◽

Vol 48 (9) ◽

pp. 09KA02

Author(s):

Yohei Otani ◽

Yukio Fukuda ◽

Soichiro Okamura ◽

Kimitoshi Nakamura ◽

Takashi Nishida ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Formation Mechanism ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Amorphous Films ◽

Metalorganic Chemical ◽

Liquid Delivery

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Corrosion Resistant Multiple Layer Thin Oxide Films Prepared by Metalorganic Chemical Vapor Deposition

Journal of the Japan Institute of Metals and Materials ◽

10.2320/jinstmet1952.51.11_1054 ◽

1987 ◽

Vol 51 (11) ◽

pp. 1054-1059 ◽

Cited By ~ 2

Author(s):

Morio Ishikawa ◽

Katsuhisa Sugimoto

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Corrosion Resistant ◽

Multiple Layer ◽

Thin Oxide Films ◽

Thin Oxide ◽

Metalorganic Chemical

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