Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl4/O2/N2Gas Mixtures

Plasma Science and Technology ◽

10.1088/1009-0630/16/7/11 ◽

2014 ◽

Vol 16 (7) ◽

pp. 695-700

Author(s):

Jinhai Niu ◽

Zhihui Zhang ◽

Hongyu Fan ◽

Qi Yang ◽

Dongping Liu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Dielectric Barrier Discharge ◽

Vapor Deposition ◽

Barrier Discharge ◽

Oxide Films ◽

Chemical Vapor ◽

Dielectric Barrier ◽

Titanium Oxide Films

Download Full-text

Evaluation of photocatalytic properties of titanium oxide films prepared by plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.05.007 ◽

2005 ◽

Vol 489 (1-2) ◽

pp. 320-324 ◽

Author(s):

Masahiko Maeda ◽

Teruyoshi Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Photocatalytic Properties ◽

Titanium Oxide Films

Download Full-text

Photoconductive Characteristics of Hydro-Oxygenated Amorphous Titanium Oxide Films Prepared by Remote Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.4183 ◽

2006 ◽

Vol 45 (5A) ◽

pp. 4183-4186 ◽

Author(s):

Koichi Sakaguchi ◽

Koichi Shimakawa ◽

Yoshinori Hatanaka

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Remote Plasma ◽

Titanium Oxide Films

Download Full-text

Selective area chemical vapor deposition of titanium oxide films: Characterization of Ti(OC[sub 3]H[sub 7])[sub 4] as an electron beam resist

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590801 ◽

1999 ◽

Vol 17 (4) ◽

pp. 1622 ◽

Author(s):

William J. Mitchell ◽

Evelyn L. Hu

Keyword(s):

Electron Beam ◽

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Selective Area ◽

Titanium Oxide Films

Download Full-text

Structure and Properties of Silicon Titanium Oxide Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.3594 ◽

1991 ◽

Vol 30 (Part 1, No. 12B) ◽

pp. 3594-3596 ◽

Author(s):

Takeshi Kamada ◽

Masatoshi Kitagawa ◽

Munehiro Shibuya ◽

Takashi Hirao

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Structure And Properties ◽

Titanium Oxide Films

Download Full-text

Determination of photocatalytic activity in amorphous and crystalline titanium oxide films prepared using plasma-enhanced chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2010.09.022 ◽

2011 ◽

Vol 257 (6) ◽

pp. 1893-1897 ◽

Author(s):

Cheng-Yang Wu ◽

Bo-Sheng Chiang ◽

Springfield Chang ◽

Day-Shan Liu

Keyword(s):

Photocatalytic Activity ◽

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Titanium Oxide Films

Download Full-text

Cold deposition of large-area amorphous hydrogenated silicon films by dielectric barrier discharge chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2011.01.124 ◽

2011 ◽

Vol 519 (15) ◽

pp. 5038-5042 ◽

Author(s):

He. Haiyan ◽

Gao Qian ◽

Zhang Xiwen ◽

Han Gaorong

Keyword(s):

Chemical Vapor Deposition ◽

Dielectric Barrier Discharge ◽

Vapor Deposition ◽

Barrier Discharge ◽

Chemical Vapor ◽

Silicon Films ◽

Dielectric Barrier ◽

Hydrogenated Silicon ◽

Amorphous Hydrogenated Silicon

Download Full-text

Visible Light Photocatalysis of Nitrogen-Doped Titanium Oxide Films Prepared by Plasma-Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2165773 ◽

2006 ◽

Vol 153 (3) ◽

pp. C186 ◽

Author(s):

Masahiko Maeda ◽

Teruyoshi Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Visible Light ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Visible Light Photocatalysis ◽

Nitrogen Doped ◽

Titanium Oxide Films

Download Full-text

Comparison of titanium oxide films grown on bare glass and boiled glass in 50% H[sub 2]SO[sub 4] by metal-organic chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1288137 ◽

2000 ◽

Vol 18 (5) ◽

pp. 2394 ◽

Author(s):

H. K. Jang ◽

S. W. Whangbo ◽

Y. D. Chung ◽

T. G. Kim ◽

H. B. Kim ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

Titanium Oxide Films

Download Full-text

Atmospheric Pressure Plasma Initiated Chemical Vapor Deposition Using Ultra-Short Square Pulse Dielectric Barrier Discharge

Plasma Processes and Polymers ◽

10.1002/ppap.201400094 ◽

2014 ◽

Vol 12 (1) ◽

pp. 66-74 ◽

Author(s):

Nicolas D. Boscher ◽

Florian Hilt ◽

David Duday ◽

Gilles Frache ◽

Thierry Fouquet ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Dielectric Barrier Discharge ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Barrier Discharge ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Dielectric Barrier ◽

Pressure Plasma ◽

Initiated Chemical Vapor Deposition

Download Full-text

Photocatalytic characteristics of hydro-oxygenated amorphous titanium oxide films prepared using remote plasma enhanced chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2004.10.118 ◽

2005 ◽

Vol 244 (1-4) ◽

pp. 554-557 ◽

Author(s):

Y. Hatanakaa ◽

H. Naitob ◽

S. Itouc ◽

M. Kandob

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Remote Plasma ◽

Titanium Oxide Films

Download Full-text