Effect of the Tantalum Barrier Layer on the Electromigration and Stress Migration Resistance of Physical-Vapor-Deposited Copper Interconnect
2002 ◽
Vol 41
(Part 1, No. 5A)
◽
pp. 3057-3064
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Keyword(s):
2002 ◽
Vol 149
(11)
◽
pp. C573
◽
1978 ◽
Vol 36
(1)
◽
pp. 450-451
Keyword(s):
Keyword(s):
Keyword(s):