Deposition and Characterization of Low-Stress Plasma Enhanced Chemical Vapor Deposition of Tetraethoxysilane Oxide for Micro-Electro-Mechanical-Systems Applications

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Vol 43 (8A) ◽  
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Author(s):  
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Ruey-Shing Huang
2015 ◽  
Vol 32 (6) ◽  
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Xiaoqiang Su ◽  
Fan Ye ◽  
Huan Wang ◽  
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2020 ◽  
Vol 13 (7) ◽  
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Hiroki Nagai ◽  
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Takuto Igawa ◽  
...  

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...  

Nano Letters ◽  
2013 ◽  
Vol 13 (6) ◽  
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