Deposition and Characterization of Low-Stress Plasma Enhanced Chemical Vapor Deposition of Tetraethoxysilane Oxide for Micro-Electro-Mechanical-Systems Applications
2004 ◽
Vol 43
(8A)
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pp. 5491-5495
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Keyword(s):
2002 ◽
Vol 20
(3)
◽
pp. 828
◽
Keyword(s):
2007 ◽
Vol 46
(4A)
◽
pp. 1415-1426
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Keyword(s):