Erratum: “Amorphous Silicon Film Deposition from SiH4by Chemical Vapor Deposition with Argon Excimer Lamp”

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.4301 ◽

2006 ◽

Vol 45 (5A) ◽

pp. 4301-4301

Author(s):

Kiyohiko Toshikawa ◽

Atsushi Yokotani ◽

Kou Kurosawa

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Film Deposition ◽

Excimer Lamp ◽

Amorphous Silicon Film

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Amorphous Silicon Film Deposition from SiH4by Chemical Vapor Deposition with Argon Excimer Lamp

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.7785 ◽

2005 ◽

Vol 44 (11) ◽

pp. 7785-7788 ◽

Author(s):

Kiyohiko Toshikawa ◽

Atsushi Yokotani ◽

Kou Kurosawa

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Film Deposition ◽

Excimer Lamp ◽

Amorphous Silicon Film

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Measurement of SiH2Densities in an RF-Discharge Silane Plasmae Used in the Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.2588 ◽

1992 ◽

Vol 31 (Part 1, No. 8) ◽

pp. 2588-2591 ◽

Author(s):

Kunihide Tachibana ◽

Tatsuru Shirafuji ◽

Yasuji Matsui

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Rf Discharge ◽

Amorphous Silicon Film ◽

Hydrogenated Amorphous

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Smooth Surface Morphology of Hydrogenated Amorphous Silicon Film Prepared by Plasma Enhanced Chemical Vapor Deposition

Plasma Science and Technology ◽

10.1088/1009-0630/11/5/11 ◽

2009 ◽

Vol 11 (5) ◽

pp. 569-575 ◽

Author(s):

Yan Xu ◽

Feng Fei ◽

Zhang Jin ◽

Wang Yuelin

Keyword(s):

Chemical Vapor Deposition ◽

Surface Morphology ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Smooth Surface ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Amorphous Silicon Film ◽

Hydrogenated Amorphous

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Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition (<150 °C) and Laser Crystallization for Polycrystalline Silicon Thin-Film Transistor Application

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.l227 ◽

2006 ◽

Vol 45 (No. 8) ◽

pp. L227-L229 ◽

Author(s):

Sung-Hyun Lee ◽

Wan-Shick Hong ◽

Jong-Man Kim ◽

Hyuck Lim ◽

Kuyng-Bae Park ◽

...

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Silicon Film ◽

Chemical Vapor ◽

Film Deposition ◽

Laser Crystallization ◽

Silicon Thin Film ◽

Amorphous Silicon Film

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Effect of Ar+Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.6404 ◽

2000 ◽

Vol 39 (Part 1, No. 11) ◽

pp. 6404-6409 ◽

Author(s):

Isamu Kato ◽

Yuuki Nakano ◽

Nobuhiko Yamaguchi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Film Growth ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Amorphous Silicon Film ◽

Hydrogenated Amorphous

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Erratum: “Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition (<150 °C) and Laser Crystallization for Polycrystalline Silicon Thin-Film Transistor Application”

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.l485 ◽

2006 ◽

Vol 45 (No. 18) ◽

pp. L485-L485

Author(s):

Sung-Hyun Lee ◽

Wan-Shick Hong ◽

Jong-Man Kim ◽

Hyuck Lim ◽

Kuyng-Bae Park ◽

...

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Silicon Film ◽

Chemical Vapor ◽

Film Deposition ◽

Laser Crystallization ◽

Silicon Thin Film ◽

Amorphous Silicon Film

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Study of Silicidation Process of Tungsten Catalyzer during Silicon Film Deposition in Catalytic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.3692 ◽

2008 ◽

Vol 47 (5) ◽

pp. 3692-3698 ◽

Author(s):

Kazuhiro Honda ◽

Keisuke Ohdaira ◽

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Film Deposition ◽

Catalytic Chemical Vapor Deposition

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Detection of Si nanoclusters by x-ray scattering during silicon film deposition by mesoplasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.2956692 ◽

2008 ◽

Vol 104 (1) ◽

pp. 013536 ◽

Author(s):

Jose Mario A. Diaz ◽

Makoto Kambara ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Film Deposition ◽

X Ray ◽

X Ray Scattering ◽

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Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition

Current Applied Physics ◽

10.1016/j.cap.2019.11.001 ◽

2020 ◽

Vol 20 (1) ◽

pp. 191-195 ◽

Author(s):

Yeonwon Kim ◽

Kazunori Koga ◽

Masaharu Shiratani

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Volume Fraction ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Cluster ◽

Amorphous Silicon Film ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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Microcrystalline Silicon Film Deposition from H 2 ‐ He ‐ SiH4 Using Remote Plasma Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1838733 ◽

1998 ◽

Vol 145 (8) ◽

pp. 2900-2904 ◽

Author(s):

Sung‐Woo Lee ◽

Du‐Chang Heo ◽

Jin‐Kyu Kang ◽

Young‐Bae Park ◽

Shi‐Woo Rhee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Film Deposition ◽

Microcrystalline Silicon ◽

Remote Plasma ◽

Microcrystalline Silicon Film

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