Thermal Stability of Nickel Silicide and Shallow Junction Electrical Characteristics with Carbon Ion Implantation
2010 ◽
Vol 49
(4)
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pp. 04DA04
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1973 ◽
Vol 120
(12)
◽
pp. 1767
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2006 ◽
Vol 83
(2)
◽
pp. 345-350
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1998 ◽
Vol 16
(2)
◽
pp. 477-481
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