Deposition Yield and Physical Properties of Carbon Films Deposited by Focused-Ion-Beam Chemical Vapor Deposition

2010 ◽  
Vol 49 (6) ◽  
pp. 06GH08
Author(s):  
Takashi Kaito ◽  
Hiroshi Oba ◽  
Yasuhiko Sugiyama ◽  
Anto Yasaka ◽  
Jun-ichi Fujita ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Physical Properties ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Deposition Yield

Thermal Durability of Diamond Like Carbon Films Containing Tungsten Fabricated by Focused-Ion-Beam Chemical Vapor Deposition

2012 ◽  
Vol 51 (6S) ◽  
pp. 06FD07 ◽  
Author(s):  
Akihiro Fujimoto ◽  
Makoto Okada ◽  
Yuji Kang ◽  
Masahito Niibe ◽  
Shinji Matsui ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Thermal Durability

Thermal Durability of Diamond Like Carbon Films Containing Tungsten Fabricated by Focused-Ion-Beam Chemical Vapor Deposition

2012 ◽  
Vol 51 ◽  
pp. 06FD07
Author(s):  
Akihiro Fujimoto ◽  
Makoto Okada ◽  
Yuji Kang ◽  
Masahito Niibe ◽  
Shinji Matsui ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Thermal Durability

Concurrent synthesis and boron-doping of amorphous carbon films by focused ion beam-assisted chemical vapor deposition

2021 ◽  
pp. 138704
Author(s):  
Ryo Matsumoto ◽  
El Hadi S. Sadki ◽  
Hiromi Tanaka ◽  
Sayaka Yamamoto ◽  
Shintaro Adachi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Boron Doping ◽  
Carbon Films ◽  
Amorphous Carbon Films

Transmission Electron Microscopy (TEM) Specimen Preparation Technique using Focused Ion Beam (FIB): Application to Material Characterization of Chemical Vapor Deposition of Tungsten (W) and Tungsten Silicides (WSix)

1997 ◽  
Author(s):  
K. Doong ◽  
J.-M. Fu ◽  
Y.-C. Huang
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Specimen Preparation ◽  
Preparation Technique ◽  
Transmission Electron

Abstract The specimen preparation technique using focused ion beam (FIB) to generate cross-sectional transmission electron microscopy (XTEM) samples of chemical vapor deposition (CVD) of Tungsten-plug (W-plug) and Tungsten Silicides (WSix) was studied. Using the combination method including two axes tilting[l], gas enhanced focused ion beam milling[2] and sacrificial metal coating on both sides of electron transmission membrane[3], it was possible to prepare a sample with minimal thickness (less than 1000 A) to get high spatial resolution in TEM observation. Based on this novel thinning technique, some applications such as XTEM observation of W-plug with different aspect ratio (I - 6), and the grain structure of CVD W-plug and CVD WSix were done. Also the problems and artifacts of XTEM sample preparation of high Z-factor material such as CVD W-plug and CVD WSix were given and the ways to avoid or minimize them were suggested.

Non-Core–Shell Nanostructure Deposition on Focused-Ion-Beam Chemical Vapor Deposition

2010 ◽  
Vol 49 (6) ◽  
pp. 06GE03 ◽  
Author(s):  
Reo Kometani ◽  
Shin'ichi Warisawa ◽  
Sunao Ishihara
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Core Shell
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