Size Reduction and Phosphorus Doping of Silicon Nanocrystals Prepared by a Very High Frequency Plasma Deposition System

2011 ◽  
Vol 50 (2) ◽  
pp. 025002 ◽  
Author(s):  
Yoshifumi Nakamine ◽  
Naoki Inaba ◽  
Tetsuo Kodera ◽  
Ken Uchida ◽  
Rui N. Pereira ◽  
...  
Keyword(s):  
High Frequency ◽  
Silicon Nanocrystals ◽  
Plasma Deposition ◽  
Size Reduction ◽  
Very High Frequency ◽  
Phosphorus Doping ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Size Reduction and Phosphorus Doping of Silicon Nanocrystals Prepared by a Very High Frequency Plasma Deposition System

2011 ◽  
Vol 50 (2R) ◽  
pp. 025002 ◽  
Author(s):  
Yoshifumi Nakamine ◽  
Naoki Inaba ◽  
Tetsuo Kodera ◽  
Ken Uchida ◽  
Rui N. Pereira ◽  
...  
Keyword(s):  
High Frequency ◽  
Silicon Nanocrystals ◽  
Plasma Deposition ◽  
Size Reduction ◽  
Very High Frequency ◽  
Phosphorus Doping ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Characteristics of Very High Frequency Plasma Produced Using a Ladder-Shaped Electrode

1999 ◽  
Vol 38 (Part 1, No. 7B) ◽  
pp. 4305-4308 ◽  
Author(s):  
Hiroshi Mashima ◽  
Masayoshi Murata ◽  
Yoshiaki Takeuchi ◽  
Hideo Yamakoshi ◽  
Tatsuji Horioka ◽  
...  
Keyword(s):  
High Frequency ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High
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