Post Deposition Annealing Atmosphere Effect on SSI-LEDs Made of Zr-Doped HfO2 High-k Gate Dielectric

2015 ◽  
Vol 69 (12) ◽  
pp. 17-22 ◽  
Author(s):  
S. Zhang ◽  
Y. Kuo ◽  
S. Verkhoturov
Keyword(s):  
Gate Dielectric ◽  
Annealing Atmosphere ◽  
Post Deposition Annealing ◽  
Atmosphere Effect ◽  
High K ◽  
Post Deposition ◽  
High K Gate Dielectric

Experimental observations of the thermal stability of high-k gate dielectric materials on silicon

2002 ◽  
Vol 303 (1) ◽  
pp. 54-63 ◽  
Author(s):  
P.S. Lysaght ◽  
P.J. Chen ◽  
R. Bergmann ◽  
T. Messina ◽  
R.W. Murto ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Gate Dielectric ◽  
Dielectric Materials ◽  
High K ◽  
Thermal Stability Of ◽  
High K Gate Dielectric
Sign in / Sign up

Export Citation Format

Share Document