Characterization of Silicon Carbon Nitride for Low Temperature Wafer-to-Wafer Direct Bonding

2020 ◽  
Vol 98 (4) ◽  
pp. 21-31
Author(s):  
Fuya Nagano ◽  
Serena Iacovo ◽  
Alain Phommahaxay ◽  
Fumihiro Inoue ◽  
Erik Sleeckx ◽  
...  
Keyword(s):  
Low Temperature ◽  
Carbon Nitride ◽  
Silicon Carbon ◽  
Wafer Direct Bonding ◽  
Silicon Carbon Nitride

Characterization of Silicon Carbon Nitride for Low Temperature Wafer-to-Wafer Direct Bonding

2020 ◽  
Vol MA2020-02 (22) ◽  
pp. 1650-1650
Author(s):  
Fuya Nagano ◽  
Serena Iacovo ◽  
Alain Phommahaxay ◽  
Fumihiro Inoue ◽  
Erik Sleeckx ◽  
...  
Keyword(s):  
Low Temperature ◽  
Carbon Nitride ◽  
Silicon Carbon ◽  
Wafer Direct Bonding ◽  
Silicon Carbon Nitride

scholarly journals Film Characterization of Low-Temperature Silicon Carbon Nitride for Direct Bonding Applications

2020 ◽  
Vol 9 (12) ◽  
pp. 123011
Author(s):  
F. Nagano ◽  
S. Iacovo ◽  
A. Phommahaxay ◽  
F. Inoue ◽  
E. Sleeckx ◽  
...  
Keyword(s):  
Low Temperature ◽  
Carbon Nitride ◽  
Silicon Carbon ◽  
Silicon Carbon Nitride

Processing and characterization of silicon carbon-nitride ceramics: application of electrical properties towards MEMS thermal actuators

2003 ◽  
Vol 103 (1-2) ◽  
pp. 171-181 ◽  
Author(s):  
Li-Anne Liew ◽  
R.A. Saravanan ◽  
Victor M. Bright ◽  
Martin L. Dunn ◽  
John W. Daily ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Carbon Nitride ◽  
Thermal Actuators ◽  
Silicon Carbon ◽  
Nitride Ceramics ◽  
Silicon Carbon Nitride

Hard plasma chemical coatings based on silicon carbon nitride

2007 ◽  
Vol 46 (11-12) ◽  
pp. 543-549 ◽  
Author(s):  
L. A. Ivashchenko ◽  
V. I. Ivashchenko ◽  
O. K. Porada ◽  
S. M. Dub ◽  
P. L. Skrinskii ◽  
...  
Keyword(s):  
Carbon Nitride ◽  
Plasma Chemical ◽  
Silicon Carbon ◽  
Silicon Carbon Nitride

PECVD synthesis, optical and mechanical properties of silicon carbon nitride films

2015 ◽  
Vol 339 ◽  
pp. 102-108 ◽  
Author(s):  
Evgeniya Ermakova ◽  
Yurii Rumyantsev ◽  
Artur Shugurov ◽  
Alexey Panin ◽  
Marina Kosinova
Keyword(s):  
Mechanical Properties ◽  
Carbon Nitride ◽  
Silicon Carbon ◽  
Optical And Mechanical Properties ◽  
Silicon Carbon Nitride

Silicon Carbon Nitride Thin Films Produced by Magnetron Reactive Sputtering Physical Vapour Deposition: Structural, Chemical and Mechanical Characterisation

2017 ◽  
Vol 33 (1-2) ◽  
pp. 44
Author(s):  
P. Kouakou ◽  
P. Yoboue ◽  
B. Ouattara ◽  
V. Hody ◽  
P. Choquet ◽  
...  
Keyword(s):  
Carbon Nitride ◽  
Vapour Deposition ◽  
Reactive Sputtering ◽  
Mechanical Characterisation ◽  
Silicon Carbon ◽  
Film Adhesion ◽  
Experimental Parameters ◽  
Nitrogen Percentage ◽  
Silicon Carbon Nitride

Amorphous silicon carbon nitride films were deposited on silicon and WC-Co substrates by magnetron reactive sputtering in Ar/N<sub>2</sub> gas mixture with carbon and silicon targets. The influence of experimental parameters on the films morphological, structural and mechanical properties was studied. The general morphology of the film is observed by SEM and TEM. EDXS and FTIR were used to determine the film chemical composition and the nature of chemical bonding. It was observed that C≡N bonds and nitrogen percentage in the film are promoted when the substrate is biased. The role of an underlayer and the influence of its nature on the film adhesion on WC/Co substrates were also studied. In this case, nanoscratch tests showed that a SiNx thin film could be an appropriate underlayer.

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