Properties of Rf Magnetron Sputter Deposited Cobalt Oxide Thin Films as Anode for Hydrogen Generation by Electrochemical Water Splitting

2019 ◽  
Vol 3 (5) ◽  
pp. 261-266 ◽  
Author(s):  
William B. Ingler ◽  
Dinesh Attygalle ◽  
Xunming Deng
Keyword(s):  
Thin Films ◽  
Cobalt Oxide ◽  
Water Splitting ◽  
Hydrogen Generation ◽  
Oxide Thin Films ◽  
Rf Magnetron Sputter ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Electrochemical Water Splitting

Effect of oxygen partial pressure in deposition ambient on the properties of RF magnetron sputter deposited Gd_2O_3 thin films

2017 ◽  
Vol 56 (22) ◽  
pp. 6114 ◽  
Author(s):  
S. Maidul Haque ◽  
Rajnarayan De ◽  
S. Tripathi ◽  
C. Mukherjee ◽  
A. K. Yadav ◽  
...  
Keyword(s):  
Thin Films ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Rf Magnetron Sputter ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Effect Of Oxygen

Rf Magnetron Sputter Deposition and Characterization of Aluminum Nitride thin Films

1986 ◽  
Vol 77 ◽  
Author(s):  
Saluru B. Krupanidhi
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
High Energy ◽  
Axis Orientation ◽  
Deposition Parameters ◽  
Structural And Electrical Properties ◽  
Magnetron Sputter Deposition ◽  
Rf Magnetron Sputter ◽  
Magnetron Sputter ◽  
Sputter Deposited

ABSTRACTHighly crystalline and resistive thin films of aluminum nitride have been rf magnetron sputter deposited. The films were characterized in terms of structure, electrical and optical properties. A perfect c-axis orientation along (002) direction was obtained, in the reactive sputtered films from a metal target, keeping the substrates as low as 350°C. The structural and electrical properties were observed to be sensitive to deposition conditions. It has also been observed that the combination of higher powers and low sputtering pressures, exposed the films to high energy neutral ion bombardment. A correlation between deposition parameters and the physical properties is presented.

scholarly journals The goldilocks electrolyte: examining the performance of iron/nickel oxide thin films as catalysts for electrochemical water splitting in various aqueous NaOH solutions

2016 ◽  
Vol 4 (29) ◽  
pp. 11397-11407 ◽  
Author(s):  
Michelle P. Browne ◽  
Shelley Stafford ◽  
Maria O'Brien ◽  
Hugo Nolan ◽  
Nina C. Berner ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Sodium Hydroxide ◽  
Water Splitting ◽  
Oxide Thin Films ◽  
Fe Oxides ◽  
Iron Nickel ◽  
Rigorous Study ◽  
Electrochemical Water Splitting ◽  
Fe Impurity

A rigorous study of electrodeposited Ni/Fe oxides for the OER was performed in three different sodium hydroxide electrolytes with various Fe impurity concentrations.

Superior optoelectrical properties of magnetron sputter-deposited cerium-doped indium oxide thin films for solar cell applications

2021 ◽  
Vol 47 (2) ◽  
pp. 1798-1806
Author(s):  
Krishanu Dey ◽  
Armin G. Aberle ◽  
Stella van Eek ◽  
Selvaraj Venkataraj
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Indium Oxide ◽  
Oxide Thin Films ◽  
Magnetron Sputter ◽  
Sputter Deposited

Structural properties of rf magnetron sputter deposited nickel manganate thin films

2005 ◽  
Vol 595 (1-3) ◽  
pp. 239-248 ◽  
Author(s):  
R. Schmidt ◽  
A. Basu ◽  
A.W. Brinkman ◽  
T.P.A. Hase ◽  
Z. Klusek ◽  
...  
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Rf Magnetron Sputter ◽  
Magnetron Sputter ◽  
Sputter Deposited
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