Transport in Ultrathin SOI MOSFETs and Silicon Nanowire Transistors

2019 ◽  
Vol 11 (6) ◽  
pp. 403-411 ◽  
Author(s):  
Toshiro Hiramoto
2021 ◽  
Vol 21 (8) ◽  
pp. 4330-4335
Author(s):  
Jaemin Son ◽  
Doohyeok Lim ◽  
Sangsig Kim

In this study, we examine the electrical characteristics of p+–n+–i–n+ silicon-nanowire field-effect transistors with partially gated channels. The silicon-nanowire field-effect transistors operate with barrier height modulation through positive feedback loops of charge carriers triggered by impact ionization. Our field-effect transistors exhibit outstanding switching characteristics, with an on current of ˜10−4 A, an on/off current ratio of ˜106, and a point subthreshold swing of ˜23 mV/dec. Moreover, the devices inhibit ambipolar characteristics because of the use of the partially gated structure and feature the p-channel operation mode.


2012 ◽  
Vol 70 ◽  
pp. 92-100 ◽  
Author(s):  
Nima Dehdashti Akhavan ◽  
Isabelle Ferain ◽  
Ran Yu ◽  
Pedram Razavi ◽  
Jean-Pierre Colinge

Nano Letters ◽  
2011 ◽  
Vol 12 (1) ◽  
pp. 119-124 ◽  
Author(s):  
André Heinzig ◽  
Stefan Slesazeck ◽  
Franz Kreupl ◽  
Thomas Mikolajick ◽  
Walter M. Weber

Sign in / Sign up

Export Citation Format

Share Document