Junction Photovoltage (JPV) Techniques for Ultra-Shallow Junction Characterization

2019 ◽  
Vol 11 (3) ◽  
pp. 135-147 ◽  
Author(s):  
Vladimir N. Faifer ◽  
Michael I. Current ◽  
D. Schroder ◽  
Trudo Clarysse ◽  
Wilfried Vandervorst
Keyword(s):  
Shallow Junction

Laser thermal processing for shallow junction and silicide formation

1998 ◽  
Author(s):  
Somit Talwar ◽  
Gaurav Verma ◽  
Kurt H. Weiner ◽  
Carol Gelatos
Keyword(s):  
Thermal Processing ◽  
Silicide Formation ◽  
Shallow Junction ◽  
Laser Thermal Processing

Nano-scale Depth Profiles of Electrical Properties of Phosphorus Doped Silicon for Ultra-Shallow Junction Evaluation

2021 ◽  
pp. 1-1
Author(s):  
Hung-Yuan Chang ◽  
Yew-Chung Sermon Wu ◽  
Chia-He Chang ◽  
Kun-Lin Lin ◽  
Abhijeet Joshi ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Shallow Junction ◽  
Depth Profiles ◽  
Nano Scale ◽  
Doped Silicon ◽  
Phosphorus Doped

Using point defect engineering to reduce the effects of energy nonmonochromaticity of B ion beams on shallow junction formation

2004 ◽  
Vol 96 (1) ◽  
pp. 919-921 ◽  
Author(s):  
Lin Shao ◽  
John Chen ◽  
Jianming Zhang ◽  
D. Tang ◽  
Sanjay Patel ◽  
...  
Keyword(s):  
Point Defect ◽  
Ion Beams ◽  
Defect Engineering ◽  
Shallow Junction ◽  
Junction Formation

Gate overlap length reduction and shallow junction formation in high-performance fine MOSFETs by ion implantation through thin oxide film

1998 ◽  
Vol 34 (25) ◽  
pp. 2436
Author(s):  
T. Oishi ◽  
A. Furukawa ◽  
K. Shiozawa ◽  
Y. Abe ◽  
Y. Tokuda
Keyword(s):  
Oxide Film ◽  
Ion Implantation ◽  
High Performance ◽  
Shallow Junction ◽  
Thin Oxide Film ◽  
Junction Formation ◽  
Thin Oxide ◽  
Length Reduction

Shallow junction formation by preamorphization with tin implantation

1986 ◽  
Vol 49 (10) ◽  
pp. 575-577 ◽  
Author(s):  
M. Delfino ◽  
D. K. Sadana ◽  
A. E. Morgan
Keyword(s):  
Shallow Junction ◽  
Junction Formation

A defect behavior in boron shallow junction formation of Si under low-temperature pre-anneal and non-melt-laser anneal

2010 ◽  
Author(s):  
Suhei Hara ◽  
Yusuke Shigenaga ◽  
Satoru Matsumoto ◽  
Genshu Fuse ◽  
Susumu Sakuragi
Keyword(s):  
Low Temperature ◽  
Shallow Junction ◽  
Junction Formation ◽  
Laser Anneal ◽  
Defect Behavior

Effects of low-temperature postannealing on a n+-p shallow junction fabricated by plasma doping

2005 ◽  
Vol 86 (19) ◽  
pp. 193503 ◽  
Author(s):  
Sungkweon Baek ◽  
Hyunsang Hwang ◽  
Kiju Im ◽  
Chang-Geun Ahn ◽  
Jong-Heon Yang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Shallow Junction ◽  
Plasma Doping
Sign in / Sign up

Export Citation Format

Share Document