In Situ Gas-Phase Diagnostics for Titanium Nitride Atomic Layer Deposition

2011 ◽  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Gas Phase ◽  
Atomic Layer ◽  
Layer Deposition

In Situ Gas-Phase Diagnostics for Titanium Nitride Atomic Layer Deposition

2019 ◽  
Vol 41 (2) ◽  
pp. 157-167 ◽  
Author(s):  
James E. Maslar ◽  
William Kimes ◽  
Brent Sperling
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Gas Phase ◽  
Atomic Layer ◽  
Layer Deposition

In Situ Gas Phase Diagnostics for Hafnium Oxide Atomic Layer Deposition

2019 ◽  
Vol 13 (2) ◽  
pp. 139-149 ◽  
Author(s):  
James E. Maslar ◽  
W.S. Hurst ◽  
D.R. Burgess ◽  
William Kimes ◽  
Nhan V. Nguyen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Gas Phase ◽  
Hafnium Oxide ◽  
Atomic Layer ◽  
Layer Deposition

Advantages of Hydrogen Peroxide as an Oxidant for Atomic Layer Deposition and Related Novel Delivery System

2013 ◽  
Vol 1494 ◽  
pp. 209-214 ◽  
Author(s):  
Jeff Spiegelman ◽  
Dan Alvarez ◽  
Russell J. Holmes ◽  
Ed Heinlein ◽  
Zohreh Shamsi
Keyword(s):  
Hydrogen Peroxide ◽  
Atomic Layer Deposition ◽  
Gas Phase ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Oxidation Properties ◽  
Temperature And Pressure ◽  
Phase Chemistry ◽  
Transfer Properties

ABSTRACTProposed is the use of Hydrogen Peroxide (H2O2) as the ideal oxidant for atomic layer deposition of metal oxide films. H2O2 has similar oxidation properties to Ozone while simultaneously having slightly stronger proton transfer properties than water. Vital to the success of any vapor phase chemistry is delivery of stable compositions, temperature and pressure. This study demonstrates the viability of a new membrane technology for the precise delivery of H2O2/ H2O mixtures starting from a liquid range of 30-70%. An in-situ gas phase cleaning process to remove carbon contamination from Ge(100) surfaces using gas phase H2O2 has been characterized.

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