Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
2016 ◽
Vol 28
(16)
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pp. 5864-5871
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Keyword(s):
2010 ◽
Vol 28
(4)
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pp. 613-621
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2011 ◽
Vol 11
(9)
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pp. 8226-8232
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Keyword(s):
2014 ◽
Vol 118
(11)
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pp. 5862-5871
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2018 ◽
Vol 20
(39)
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pp. 25343-25356
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Keyword(s):
2018 ◽
Vol 36
(3)
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pp. 031513
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