Hollow Cathode Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using Pentachlorodisilane
2018 ◽
Vol 10
(16)
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pp. 14116-14123
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2014 ◽
Vol 32
(3)
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pp. 031508
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2019 ◽
Vol 37
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pp. 020927
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2018 ◽
Vol 36
(1)
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pp. 01A110
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2015 ◽
Vol 3
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pp. 5199-5206
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2020 ◽
Vol 38
(6)
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pp. 062407
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