Reactive Force-Field Molecular Dynamics Study of SiGe Thin Film Growth in Plasma Enhanced Chemical Vapor Deposition Processes

2020 ◽  
Vol MA2020-02 (24) ◽  
pp. 1717-1717
Author(s):  
Naoya Uene ◽  
Takuya Mabuchi ◽  
Masaru Zaitsu ◽  
Shigeo Yasuhara ◽  
Takashi Tokumasu
Keyword(s):  
Thin Film ◽  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Force Field ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Thin Film Growth ◽  
Reactive Force ◽  
Deposition Processes

Effect of hydrogen atmosphere in Cu thin film growth by chemical vapor deposition using Cu(dmamb)2

2012 ◽  
Vol 89 ◽  
pp. 109-115 ◽  
Author(s):  
Jong Mun Choi ◽  
Dohan Lee ◽  
Ji Hun Park ◽  
Chang Gyoun Kim ◽  
Taek-Mo Chung ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Hydrogen Atmosphere ◽  
Thin Film Growth ◽  
Cu Thin Film

Model studies of dielectric thin film growth: Chemical vapor deposition of SiO2

1990 ◽  
Vol 8 (3) ◽  
pp. 1864-1870 ◽  
Author(s):  
John E. Crowell ◽  
Laura L. Tedder ◽  
Hee‐Chuen Cho ◽  
Frank M. Cascarano ◽  
Mark A. Logan
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Thin Film Growth ◽  
Dielectric Thin Film ◽  
Model Studies
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