Optical and Electrical Properties of SnO2:F Thin Films Obtained by R.F. Sputtering With Various Targets
1991 ◽
Vol 14
(3)
◽
pp. 111-118
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Keyword(s):
Tin oxide films were deposited on glass substrates by reactive and non reactive r.f. sputtering using different types of targets corresponding to various Sn/F atomic ratio: hot pressed Sn–SnF2or SnO2–SnF2mixtures, ceramics obtained by casting either an aqueous SnO2–SnF2slurry or a suspension of tin oxide in molten tin fluoride. The samples were prepared in oxygen-argon gas mixtures in which the oxygen concentration was varied from 0 mole % up to 30 mole% depending on the target. The optical and electrical properties of the obtained thin films have been studied and compared to those of the films obtained by spray technique.
2013 ◽
Vol 24
(12)
◽
pp. 4925-4931
Keyword(s):
2011 ◽
Vol 04
(04)
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pp. 401-405
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2019 ◽
2015 ◽
Vol 344
◽
pp. 217-222
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Keyword(s):
2015 ◽
Vol 86
◽
pp. 403-411
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Keyword(s):
2011 ◽
Vol 205
(8-9)
◽
pp. 2852-2856
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Keyword(s):
Keyword(s):
2009 ◽
Vol 63
(6-7)
◽
pp. 641-643
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