Relationship Between Air Exposure Time and Water Relations of Cut Roses

2019 ◽  
Vol 27 (4) ◽  
pp. 267-277
Author(s):  
Suong Tuyet Thi Ha ◽  
Minjung Kwon ◽  
Toan Khac Nguyen ◽  
Jin-Hee Lim
1996 ◽  
Vol 443 ◽  
Author(s):  
Seoghyeong Lee ◽  
Jae-Yoon Yoo ◽  
Jong-Wan Park

AbstractThe reliability of SiOF films for intermetal dielectrics in multilevel interconnections of ULSIs is investigated. SiOF films were deposited by ECRCVD using H-free source gases, i.e., SiF4 and O2. The effect of post plasma treatment on the moisture absorption and dielectric properties of SiOF films were carried out in terms of air exposure time. The reliability test of Cu / TiN / SiOF / Si specimen was carried out in terms of temperatures by RTA in N2 ambient. After O2 plasma treatment, no appreciable peak directly related to moisture absorption was detected. The C-V characteristics of the O2 plasma treated SiOF film showed that the film remained to hold the sound dielectric properties even after boiling treatment. The Cu / TiN / SiOF / Si system was found to be reliable up to 600 °C.


2003 ◽  
Vol 80 (7) ◽  
pp. 685-695 ◽  
Author(s):  
Maurizio Servili ◽  
Roberto Selvaggini ◽  
Agnese Taticchi ◽  
Sonia Esposto ◽  
Gianfrancesco Montedoro

2017 ◽  
Vol 751 ◽  
pp. 137-142
Author(s):  
S.Tipawan Khlayboonme ◽  
Warawoot Thowladda

TiO2 thin films coated on glass substrates for self-cleaning applications were prepared by sol-gel dip-coating technique. The influence of annealing temperature and air exposure time on wettability was investigated by a water contact-angle measurement. Thermal annealing at temperatures of 100, 200 and 300 °C in air were conducted to the films. Surface morphology of the films was observed by FE-SEM. Elemental distribution and optical properties were examined by EDX mapping and UV-Vis transmission spectroscopy, respectively. Atomic bonding was confirmed by FTIR. The contact angle reached a maximum when the films were annealed at 200 °C. The contact angles of the as-synthesized films were 61.4±2.7°. During storage in air for 20 days, the contact angles increased to 143.1±2.1°. The films were further reannealed with 100 °C for 20 min, the contact angles were enhanced to 153.1±1.3°. The association of contact angle among the surface morphology, elemental distribution and atomic bonding of the films will be discussed.


Data in Brief ◽  
2019 ◽  
Vol 27 ◽  
pp. 104668
Author(s):  
Jiseong Jang ◽  
Sangyeob Lee ◽  
Choong-Heui Chung
Keyword(s):  

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