Measurement of Adhesion Force by a Symmetric AFM Probe for Nano-imprint Lithography Application

The reliable reproducibility of nano patterns or other nano structures is one of many issues in the nano-imprint lithography process. An important prerequisite for reproducibility is suitable adhesion properties of adhesion promoters or anti-sticking layer. In this study, rhombus shaped symmetrical probe with a flat tip was developed and fabricated using MEMS fabrication technique. For the experimental setup of the adhesion test using a UV curable PAK01 resin coated AFM tip with several adhesion promoters, the flat tip is covered by PAK01 resist using micromanipulator. Anti-sticking layers of silane agents were prepared on the tip by vapor deposition method. Adhesion force between various adhesion promoters (GPTS, APMDS, APTS, DUV30J, O2 planairzation) and PAK01 resist and the force between anti-sticking layer (FOTS, DDMS) and PAK01 resist were evaluated using the force-distance mode of AFM. Adhesion force of GPTS and FOTS are about 7180 nN and 1660 nN, respectively.

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Removal of Polymer for Nano-imprint Lithography using Atomic Hydrogen Generated by the Hot-wire Catalyzer

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.24.383 ◽

2011 ◽

Vol 24 (4) ◽

pp. 383-388 ◽

Cited By ~ 3

Author(s):

Akihiko Kono ◽

Takashi Maruoka ◽

Arai Yu ◽

Yoshihiko Hirai ◽

Hideo Horibe

Keyword(s):

Atomic Hydrogen ◽

Imprint Lithography ◽

Hot Wire ◽

Nano Imprint

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Submicron Patterned Anodic Oxidation of Aluminum Thin Films

MRS Proceedings ◽

10.1557/proc-636-d9.49.1 ◽

2000 ◽

Vol 636 ◽

Cited By ~ 2

Author(s):

Qiyu Huang ◽

Whye-Kei Lye ◽

David M. Longo ◽

Michael L. Reed

Keyword(s):

Thin Films ◽

Anodic Oxidation ◽

Ion Beam ◽

Electrochemical Anodization ◽

Optical Methods ◽

Imprint Lithography ◽

Aluminum Films ◽

Aspect Ratios ◽

Potential Applications ◽

Nano Imprint

AbstractAlumina formed by the electrochemical anodization of bulk aluminum has a regular porous structure [1]. Sub-100 nm pores with aspect ratios as high as 1000:1 can easily be formed [2] without elaborate processing. Anodization of aluminum thus provides the basis for the inexpensive, high throughput microfabrication of structures with near vertical sidewalls [2]. In this work we explore the patterned anodic oxidation of deposited aluminum thin films, facilitating the integration of this technique with established microfabrication tools. An anodization barrier of polymethylmethacrylate (PMMA) is deposited onto 300 nm thick aluminum films. The barrier film is subsequently patterned and the exposed aluminum anodized in a 10% sulfuric acid solution. Barrier patterning techniques utilized in this study include optical exposure, ion-beam milling and nano-imprint lithography. Sharp edge definition on micron scale patterns has been achieved using optical methods. Extension of this technique to smaller dimensions by ion-beam milling and nano-imprint lithography is presented. We further report on the observation of contrast reversal of anodization with very thin PMMA barriers, which provides a novel means of pattern transfer. Potential applications and challenges will be discussed.

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